Study of the deep level related to a platinum-dihydrogen complex in Si by capacitance transient spectroscopy under uniaxial stress

Y. Kamiura, Y. Iwagami, K. Fukuda, Y. Yamashita, T. Ishiyama, Y. Tokuda

研究成果査読

9 被引用数 (Scopus)

抄録

We have applied a novel technique to combine isothermal deep-level transient spectroscopy (DLTS) with the application of uniaxial compressive stress to studying the structure of a platinum- and hydrogen-related defect, which has a gap state at 0.14 eV below the conduction band in Si. The application of 〈100〉 and 〈111〉 stresses split the DLTS peak of the defect into two components with intensity ratios of 2.3:1 and 1.1:1, respectively, which were ratios of short- to long-time components. Under 〈110〉 stress, the peak split into three components with an intensity ratio of 0.8:3.7:1. Comparing this splitting pattern to the piezospectroscopic theory of Kaplyanskii, we have uniquely determined that the defect has the orthorhombic symmetry with the C2v point group, and have identified the defect as the Pt-H2 complex previously identified by Uftring et al. [Phys. Rev. B 51 (1995) 9612]. We also observed that the defect was reoriented above 80 K along the applied uniaxial stress. Such reorientation occurred only when the defect level was not occupied by an electron. Our observation strongly suggests that the local motion of hydrogen around the Pt atom is remarkably affected by the charge state of the defect.

本文言語English
ページ(範囲)352-357
ページ数6
ジャーナルMicroelectronic Engineering
66
1-4
DOI
出版ステータスPublished - 4月 2003
イベントIUMRS-ICEM 2002 - Xi an
継続期間: 6月 10 20026月 14 2002

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 原子分子物理学および光学
  • 凝縮系物理学
  • 表面、皮膜および薄膜
  • 電子工学および電気工学

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