Room-temperature CW operation of all-MOCVD-grown Al0.3Ga0.7As/GaAs SQW lasers on Si substrates with Al0.5Ga0.5As/Al0.55Ga0.45P intermediate layers has been demonstrated for the first time. The averaged threshold current density and differential quantum efficiency of the lasers grown with the Al0.5Ga0.5As/Al0.55Ga0.45P intermediate layers are 2.23 kA/cm2 and 50.3%, respectively, which are superior to those of the lasers grown by the two-step growth technique. The characteristics of the lasers using this technique are more uniform than those grown by the two-step growth technique.
|ジャーナル||Japanese Journal of Applied Physics|
|出版ステータス||Published - 7月 1990|
ASJC Scopus subject areas