Modification of the physical properties of chemical vapor-deposited nanostructure diamond by argon-hydrogen plasma surface treatment

Y. Hayashi, D. Mori, T. Soga, T. Jimbo

研究成果査読

5 被引用数 (Scopus)

抄録

Nanostructure diamond (NSD) film with a hardness as high as 70 GPa and an average surface roughness of 10 nm has been synthesized by the two-step negative substrate bias method combined with postgrowth Ar-H2 plasma irradiation. The Ar-H2 plasma irradiation has been confirmed to improve the uniformity of grain size and shape and increase the hardness of the NSD film.

本文言語English
ページ(範囲)733-737
ページ数5
ジャーナルPhysics of the Solid State
46
4
DOI
出版ステータスPublished - 4月 2004
外部発表はい

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 凝縮系物理学

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