Hydrogen plasma treatment for Si waveguide smoothing

Jingnan Cai; Yu Wang; Yasuhiko Ishikawa; Yoshifumi Yamashita; Yoichi Kamiura; Kazumi Wada

doi:10.1109/GROUP4.2011.6053727

Hydrogen plasma treatment for Si waveguide smoothing

Jingnan Cai, Yu Wang, Yasuhiko Ishikawa, Yoshifumi Yamashita, Yoichi Kamiura, Kazumi Wada

研究成果

1 被引用数 (Scopus)

抄録

We demonstrated that remote hydrogen plasma treatment on silicon ring resonators can smooth the Si waveguides at lower than 100°C. This also provides a promising way to trim resonators for a designed add/drop wavelength.

本文言語	English
ホスト出版物のタイトル	8th IEEE International Conference on Group IV Photonics, GFP 2011
ページ	95-97
ページ数	3
DOI	https://doi.org/10.1109/GROUP4.2011.6053727
出版ステータス	Published - 11月 22 2011
イベント	8th IEEE International Conference on Group IV Photonics, GFP 2011 - London 継続期間: 9月 14 2011 → 9月 16 2011

出版物シリーズ

名前	IEEE International Conference on Group IV Photonics GFP
ISSN（印刷版）	1949-2081

Other

Other	8th IEEE International Conference on Group IV Photonics, GFP 2011
国/地域	United Kingdom
City	London
Period	9/14/11 → 9/16/11

ASJC Scopus subject areas

電子工学および電気工学
セラミックおよび複合材料
電子材料、光学材料、および磁性材料

文献へのアクセス

10.1109/GROUP4.2011.6053727

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引用スタイル

Cai, J, Wang, Y, Ishikawa, Y, Yamashita, Y, Kamiura, Y & Wada, K 2011, Hydrogen plasma treatment for Si waveguide smoothing. in 8th IEEE International Conference on Group IV Photonics, GFP 2011., 6053727, IEEE International Conference on Group IV Photonics GFP, pp. 95-97, 8th IEEE International Conference on Group IV Photonics, GFP 2011, London, United Kingdom, 9/14/11. https://doi.org/10.1109/GROUP4.2011.6053727

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title = "Hydrogen plasma treatment for Si waveguide smoothing",

abstract = "We demonstrated that remote hydrogen plasma treatment on silicon ring resonators can smooth the Si waveguides at lower than 100°C. This also provides a promising way to trim resonators for a designed add/drop wavelength.",

author = "Jingnan Cai and Yu Wang and Yasuhiko Ishikawa and Yoshifumi Yamashita and Yoichi Kamiura and Kazumi Wada",

year = "2011",

month = nov,

day = "22",

doi = "10.1109/GROUP4.2011.6053727",

language = "English",

isbn = "9781424483389",

series = "IEEE International Conference on Group IV Photonics GFP",

pages = "95--97",

booktitle = "8th IEEE International Conference on Group IV Photonics, GFP 2011",

note = "8th IEEE International Conference on Group IV Photonics, GFP 2011 ; Conference date: 14-09-2011 Through 16-09-2011",

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TY - GEN

T1 - Hydrogen plasma treatment for Si waveguide smoothing

AU - Cai, Jingnan

AU - Wang, Yu

AU - Ishikawa, Yasuhiko

AU - Yamashita, Yoshifumi

AU - Kamiura, Yoichi

AU - Wada, Kazumi

PY - 2011/11/22

Y1 - 2011/11/22

N2 - We demonstrated that remote hydrogen plasma treatment on silicon ring resonators can smooth the Si waveguides at lower than 100°C. This also provides a promising way to trim resonators for a designed add/drop wavelength.

AB - We demonstrated that remote hydrogen plasma treatment on silicon ring resonators can smooth the Si waveguides at lower than 100°C. This also provides a promising way to trim resonators for a designed add/drop wavelength.

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U2 - 10.1109/GROUP4.2011.6053727

DO - 10.1109/GROUP4.2011.6053727

M3 - Conference contribution

AN - SCOPUS:81355132418

SN - 9781424483389

T3 - IEEE International Conference on Group IV Photonics GFP

SP - 95

EP - 97

BT - 8th IEEE International Conference on Group IV Photonics, GFP 2011

T2 - 8th IEEE International Conference on Group IV Photonics, GFP 2011

Y2 - 14 September 2011 through 16 September 2011

ER -

Hydrogen plasma treatment for Si waveguide smoothing

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出版物シリーズ

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ASJC Scopus subject areas

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