Fundamental study on sputter deposition of ceramic film by large-area electron beam irradiation

S. Misumi, A. Okada, Y. Okamoto, M. Inoue

研究成果査読

4 被引用数 (Scopus)

抄録

The sputter deposition of ceramic film on metal mold steel surface by large-area electron beam (EB) irradiation was discussed. The large-area EB has high energy density enough to generate plasma above the workpiece surface during the surface smoothing process, which causes the sputtering of target material set near the workpiece surface. The sputter deposition of target material with simultaneous surface melting and resolidification of workpiece surface by large-area EB would improve the adhesion between the deposited film and the workpiece. Short ceramic tube made of alumina or zirconia as a target was put on the substrate surface of steel, and large-area EB was irradiated to the surface. The workpiece surface component and structure after the irradiation were investigated using EDX and XRD analysis, in order to discuss the possibility of large-area EB irradiation as a new coating method.

本文言語English
ページ(範囲)486-491
ページ数6
ジャーナルProcedia CIRP
6
DOI
出版ステータスPublished - 1月 1 2013
イベント17th CIRP Conference on Electro Physical and Chemical Machining, ISEM 2013 - Leuven
継続期間: 4月 8 20134月 12 2013

ASJC Scopus subject areas

  • 制御およびシステム工学
  • 産業および生産工学

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