TY - JOUR
T1 - Annealing effects on the hardening of electroless plated Ni-P layer by boron implantation
AU - Hanamoto, K.
AU - Sasaki, M.
AU - Miyashita, T.
AU - Kido, Y.
AU - Nakayama, Y.
AU - Kawamoto, Y.
AU - Fujiwara, M.
AU - Kaigawa, R.
N1 - Funding Information:
The authors are grateful to Mr. T. Nakata and Mr. K. Sekine of the Ion Engineering Research Institute Corporation for helpful assistance and Prof. H. Namba of the Department of Physics, Ritsumeikan University for helpful discussions. This work was supported in part by The Science Research Promotion Fund from Japan Private School Promotion Foundation.
Copyright:
Copyright 2018 Elsevier B.V., All rights reserved.
PY - 1998/11
Y1 - 1998/11
N2 - Annealing effects of hardening of electroless plated Ni-P layer on an iron based alloy have been studied in connection with 200 keV boron ion implantation at a dose of 1 × 1017 ions/cm2. Increases of Vickers hardness in the near-surface region were observed to an extent of 17% for the pre-annealed specimens compared to unimplanted ones. Post-annealed specimens did not show effective hardening by the implantation treatment. The chemical states of implanted ions were studied by X-ray photoelectron spectroscopy (XPS) and the results may suggest that the increase of hardness is not due to the precipitation of nickel borides, but rather due to amorphization of Ni and Ni3P.
AB - Annealing effects of hardening of electroless plated Ni-P layer on an iron based alloy have been studied in connection with 200 keV boron ion implantation at a dose of 1 × 1017 ions/cm2. Increases of Vickers hardness in the near-surface region were observed to an extent of 17% for the pre-annealed specimens compared to unimplanted ones. Post-annealed specimens did not show effective hardening by the implantation treatment. The chemical states of implanted ions were studied by X-ray photoelectron spectroscopy (XPS) and the results may suggest that the increase of hardness is not due to the precipitation of nickel borides, but rather due to amorphization of Ni and Ni3P.
KW - Electroless plated Ni-P layer
KW - Ion implantation
KW - Vickers hardness
KW - X-ray photoelectron spectroscopy
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U2 - 10.1016/S0168-583X(98)00419-4
DO - 10.1016/S0168-583X(98)00419-4
M3 - Article
AN - SCOPUS:0032207995
SN - 0168-583X
VL - 145
SP - 391
EP - 394
JO - Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
JF - Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
IS - 3
ER -