A Basic Psychophysics Study of Visual Masking Effect on Kanji Recognition for Image Recognition Technology

Qi Dai, Lichang Yao, Ikue Hattori, Qiong Wu, Jiajia Yang, Satoshi Takahashi, Yoshimichi Ejima, Jinglong Wu

研究成果

抄録

The masking paradigm is the most used method for generating subliminal stimuli. When both the target stimulus and the mask stimulus are composed of spatial pattern, the mask reduces the visibility of the target. It was called pattern masking effect. Japanese kanji as special visual semantic information, especially when kanji as a subliminal visual stimulus, it is not clear whether Kanji is regulated by the pattern masking effect. Therefore, in this study, we measured the sensitivity index of Kanji detection or discrimination in the masking paradigm using the calculation method of SDT (Signal Detection Theory). By this way, present study investigated the intensity of the masking effect. Results suggested that the sensitivity index of Kanji have the significant difference between the different target presentation time both of detection and discrimination task. As the presentation time is longer, the sensitivity index increases. Results also showed that there is a difference in the cognitive process between detection and discrimination of stimuli, and even if the stimuli can be detected, they may not be discriminated. In addition, as the intensity of the stimulus increased, the intensity of the masking effect became weaker, and it was found that the pattern mask also produces a masking effect in the detection and discrimination of Kanji. According to the research on human visual processing characteristics, it is hoped to help improve the efficiency of computer vision recognition technology.

本文言語English
ホスト出版物のタイトル2021 IEEE International Conference on Mechatronics and Automation, ICMA 2021
出版社Institute of Electrical and Electronics Engineers Inc.
ページ1292-1297
ページ数6
ISBN(電子版)9781665441001
DOI
出版ステータスPublished - 8月 8 2021
イベント18th IEEE International Conference on Mechatronics and Automation, ICMA 2021 - Takamatsu
継続期間: 8月 8 20218月 11 2021

出版物シリーズ

名前2021 IEEE International Conference on Mechatronics and Automation, ICMA 2021

Conference

Conference18th IEEE International Conference on Mechatronics and Automation, ICMA 2021
国/地域Japan
CityTakamatsu
Period8/8/218/11/21

ASJC Scopus subject areas

  • 人工知能
  • 電子工学および電気工学
  • 機械工学
  • 制御と最適化

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