Volume diffusion of atomic oxygen in α-SiO2 protective coating at various temperatures

Masahito Tagawa, Hiroshi Kinoshita, Yuichiro Ninomiya

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

The minimum thickness for an amorphous silicon dioxide (α-SiO2) protective coating required to prevent volume diffusion of atomic oxygen in a low Earth orbit (LEO) was evaluated by measuring the oxide thickness formed on Si (001) wafers in a hyperthermal atomic oxygen beam. The thickness of oxide film was measured with X-ray photoelectron spectroscopy. The diffusion length of atomic oxygen in α-SiO2 at temperatures between 297 K to 493 K, where exterior surfaces of a spacecraft may be heated in LEO, shows temperature and flux dependencies. The ground-based testing condition to evaluate performances of protective coatings will also be discussed.

Original languageEnglish
Title of host publicationInternational SAMPE Symposium and Exhibition (Proceedings)
PublisherSAMPE
Volume44
Publication statusPublished - 1999
Externally publishedYes
EventProceedings of the 1999 44th International SAMPE Symposium and Exhibition 'Envolving and Revolutionary Technologies for the New Millennium', SAMPE '99 - Long Beach, CA, USA
Duration: May 23 1999May 27 1999

Other

OtherProceedings of the 1999 44th International SAMPE Symposium and Exhibition 'Envolving and Revolutionary Technologies for the New Millennium', SAMPE '99
CityLong Beach, CA, USA
Period5/23/995/27/99

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ASJC Scopus subject areas

  • Chemical Engineering(all)
  • Chemical Engineering (miscellaneous)
  • Building and Construction
  • Polymers and Plastics

Cite this

Tagawa, M., Kinoshita, H., & Ninomiya, Y. (1999). Volume diffusion of atomic oxygen in α-SiO2 protective coating at various temperatures. In International SAMPE Symposium and Exhibition (Proceedings) (Vol. 44). SAMPE.