Abstract
The film thickness and surface damage layer of vapor-deposited L-leucine amino acid films irradiated with Ar cluster ion beams were characterized by PSCRA ellipsometry. The damaged layer on the surface of the L-leucine film irradiated with Ar cluster ion beam was quite thin, less than 1 nm in thickness. In contrast, films irradiated with Ar monomer ion beam have changed into totally different films. The ellipsometry method also allowed accurate measurements of the sputtering yield from the L-leucine film irradiated with Ar cluster ion beams at nm-order resolution. These results suggested that with proper analysis, the optical method of ellipsometry enables estimation of the surface damage layer and measurement of sputtering yield of organic films irradiated with cluster ion beams.
| Original language | English |
|---|---|
| Pages (from-to) | 84-87 |
| Number of pages | 4 |
| Journal | Surface and Interface Analysis |
| Volume | 43 |
| Issue number | 1-2 |
| DOIs | |
| Publication status | Published - Jan 2011 |
| Externally published | Yes |
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Keywords
- cluster ion
- damage evaluation
- L-leucine
- optical method
ASJC Scopus subject areas
- Chemistry(all)
- Condensed Matter Physics
- Surfaces and Interfaces
- Materials Chemistry
- Surfaces, Coatings and Films
Cite this
Using ellipsometry for the evaluation of surface damage and sputtering yield in organic films with irradiation of argon cluster ion beams. / Hada, Masaki; Ninomiya, Satoshi; Seki, Toshio; Aoki, Takaaki; Matsuo, Jiro.
In: Surface and Interface Analysis, Vol. 43, No. 1-2, 01.2011, p. 84-87.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Using ellipsometry for the evaluation of surface damage and sputtering yield in organic films with irradiation of argon cluster ion beams
AU - Hada, Masaki
AU - Ninomiya, Satoshi
AU - Seki, Toshio
AU - Aoki, Takaaki
AU - Matsuo, Jiro
PY - 2011/1
Y1 - 2011/1
N2 - The film thickness and surface damage layer of vapor-deposited L-leucine amino acid films irradiated with Ar cluster ion beams were characterized by PSCRA ellipsometry. The damaged layer on the surface of the L-leucine film irradiated with Ar cluster ion beam was quite thin, less than 1 nm in thickness. In contrast, films irradiated with Ar monomer ion beam have changed into totally different films. The ellipsometry method also allowed accurate measurements of the sputtering yield from the L-leucine film irradiated with Ar cluster ion beams at nm-order resolution. These results suggested that with proper analysis, the optical method of ellipsometry enables estimation of the surface damage layer and measurement of sputtering yield of organic films irradiated with cluster ion beams.
AB - The film thickness and surface damage layer of vapor-deposited L-leucine amino acid films irradiated with Ar cluster ion beams were characterized by PSCRA ellipsometry. The damaged layer on the surface of the L-leucine film irradiated with Ar cluster ion beam was quite thin, less than 1 nm in thickness. In contrast, films irradiated with Ar monomer ion beam have changed into totally different films. The ellipsometry method also allowed accurate measurements of the sputtering yield from the L-leucine film irradiated with Ar cluster ion beams at nm-order resolution. These results suggested that with proper analysis, the optical method of ellipsometry enables estimation of the surface damage layer and measurement of sputtering yield of organic films irradiated with cluster ion beams.
KW - cluster ion
KW - damage evaluation
KW - L-leucine
KW - optical method
UR - http://www.scopus.com/inward/record.url?scp=78951478536&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=78951478536&partnerID=8YFLogxK
U2 - 10.1002/sia.3452
DO - 10.1002/sia.3452
M3 - Article
AN - SCOPUS:78951478536
VL - 43
SP - 84
EP - 87
JO - Surface and Interface Analysis
JF - Surface and Interface Analysis
SN - 0142-2421
IS - 1-2
ER -