Using ellipsometry for the evaluation of surface damage and sputtering yield in organic films with irradiation of argon cluster ion beams

Masaki Hada, Satoshi Ninomiya, Toshio Seki, Takaaki Aoki, Jiro Matsuo

Research output: Contribution to journalArticle

5 Citations (Scopus)

Abstract

The film thickness and surface damage layer of vapor-deposited L-leucine amino acid films irradiated with Ar cluster ion beams were characterized by PSCRA ellipsometry. The damaged layer on the surface of the L-leucine film irradiated with Ar cluster ion beam was quite thin, less than 1 nm in thickness. In contrast, films irradiated with Ar monomer ion beam have changed into totally different films. The ellipsometry method also allowed accurate measurements of the sputtering yield from the L-leucine film irradiated with Ar cluster ion beams at nm-order resolution. These results suggested that with proper analysis, the optical method of ellipsometry enables estimation of the surface damage layer and measurement of sputtering yield of organic films irradiated with cluster ion beams.

Original languageEnglish
Pages (from-to)84-87
Number of pages4
JournalSurface and Interface Analysis
Volume43
Issue number1-2
DOIs
Publication statusPublished - Jan 1 2011

Keywords

  • L-leucine
  • cluster ion
  • damage evaluation
  • optical method

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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