Using ellipsometry for the evaluation of surface damage and sputtering yield in organic films with irradiation of argon cluster ion beams

Masaki Hada; Satoshi Ninomiya; Toshio Seki; Takaaki Aoki; Jiro Matsuo

doi:10.1002/sia.3452

Using ellipsometry for the evaluation of surface damage and sputtering yield in organic films with irradiation of argon cluster ion beams

Masaki Hada, Satoshi Ninomiya, Toshio Seki, Takaaki Aoki, Jiro Matsuo

Graduate School of Natural Science and Technology

Research output: Contribution to journal › Article

5 Citations (Scopus)

Abstract

The film thickness and surface damage layer of vapor-deposited L-leucine amino acid films irradiated with Ar cluster ion beams were characterized by PSC_RA ellipsometry. The damaged layer on the surface of the L-leucine film irradiated with Ar cluster ion beam was quite thin, less than 1 nm in thickness. In contrast, films irradiated with Ar monomer ion beam have changed into totally different films. The ellipsometry method also allowed accurate measurements of the sputtering yield from the L-leucine film irradiated with Ar cluster ion beams at nm-order resolution. These results suggested that with proper analysis, the optical method of ellipsometry enables estimation of the surface damage layer and measurement of sputtering yield of organic films irradiated with cluster ion beams.

Original language	English
Pages (from-to)	84-87
Number of pages	4
Journal	Surface and Interface Analysis
Volume	43
Issue number	1-2
DOIs	https://doi.org/10.1002/sia.3452
Publication status	Published - Jan 1 2011

Keywords

L-leucine
cluster ion
damage evaluation
optical method

ASJC Scopus subject areas

Chemistry(all)
Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films
Materials Chemistry

Access to Document

10.1002/sia.3452

Fingerprint Dive into the research topics of 'Using ellipsometry for the evaluation of surface damage and sputtering yield in organic films with irradiation of argon cluster ion beams'. Together they form a unique fingerprint.

Cite this

Hada, M., Ninomiya, S., Seki, T., Aoki, T., & Matsuo, J. (2011). Using ellipsometry for the evaluation of surface damage and sputtering yield in organic films with irradiation of argon cluster ion beams. Surface and Interface Analysis, 43(1-2), 84-87. https://doi.org/10.1002/sia.3452

@article{920d27d7065f4c17b3ad73750d210582,

title = "Using ellipsometry for the evaluation of surface damage and sputtering yield in organic films with irradiation of argon cluster ion beams",

abstract = "The film thickness and surface damage layer of vapor-deposited L-leucine amino acid films irradiated with Ar cluster ion beams were characterized by PSCRA ellipsometry. The damaged layer on the surface of the L-leucine film irradiated with Ar cluster ion beam was quite thin, less than 1 nm in thickness. In contrast, films irradiated with Ar monomer ion beam have changed into totally different films. The ellipsometry method also allowed accurate measurements of the sputtering yield from the L-leucine film irradiated with Ar cluster ion beams at nm-order resolution. These results suggested that with proper analysis, the optical method of ellipsometry enables estimation of the surface damage layer and measurement of sputtering yield of organic films irradiated with cluster ion beams.",

keywords = "L-leucine, cluster ion, damage evaluation, optical method",

author = "Masaki Hada and Satoshi Ninomiya and Toshio Seki and Takaaki Aoki and Jiro Matsuo",

year = "2011",

month = jan,

day = "1",

doi = "10.1002/sia.3452",

language = "English",

volume = "43",

pages = "84--87",

journal = "Surface and Interface Analysis",

issn = "0142-2421",

publisher = "John Wiley and Sons Ltd",

number = "1-2",

}

TY - JOUR

T1 - Using ellipsometry for the evaluation of surface damage and sputtering yield in organic films with irradiation of argon cluster ion beams

AU - Hada, Masaki

AU - Ninomiya, Satoshi

AU - Seki, Toshio

AU - Aoki, Takaaki

AU - Matsuo, Jiro

PY - 2011/1/1

Y1 - 2011/1/1

N2 - The film thickness and surface damage layer of vapor-deposited L-leucine amino acid films irradiated with Ar cluster ion beams were characterized by PSCRA ellipsometry. The damaged layer on the surface of the L-leucine film irradiated with Ar cluster ion beam was quite thin, less than 1 nm in thickness. In contrast, films irradiated with Ar monomer ion beam have changed into totally different films. The ellipsometry method also allowed accurate measurements of the sputtering yield from the L-leucine film irradiated with Ar cluster ion beams at nm-order resolution. These results suggested that with proper analysis, the optical method of ellipsometry enables estimation of the surface damage layer and measurement of sputtering yield of organic films irradiated with cluster ion beams.

AB - The film thickness and surface damage layer of vapor-deposited L-leucine amino acid films irradiated with Ar cluster ion beams were characterized by PSCRA ellipsometry. The damaged layer on the surface of the L-leucine film irradiated with Ar cluster ion beam was quite thin, less than 1 nm in thickness. In contrast, films irradiated with Ar monomer ion beam have changed into totally different films. The ellipsometry method also allowed accurate measurements of the sputtering yield from the L-leucine film irradiated with Ar cluster ion beams at nm-order resolution. These results suggested that with proper analysis, the optical method of ellipsometry enables estimation of the surface damage layer and measurement of sputtering yield of organic films irradiated with cluster ion beams.

KW - L-leucine

KW - cluster ion

KW - damage evaluation

KW - optical method

UR - http://www.scopus.com/inward/record.url?scp=78951478536&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=78951478536&partnerID=8YFLogxK

U2 - 10.1002/sia.3452

DO - 10.1002/sia.3452

M3 - Article

AN - SCOPUS:78951478536

VL - 43

SP - 84

EP - 87

JO - Surface and Interface Analysis

JF - Surface and Interface Analysis

SN - 0142-2421

IS - 1-2

ER -