Two-axis-of-rotation drive system in electron-beam lithography apparatus for nanotechnology applications

K. Yamazaki, H. Namatsu

Research output: Contribution to journalConference articlepeer-review

23 Citations (Scopus)


A two-axis-of-rotation drive system has been developed that enables electron-beam lithography (EBL) to be applied to three-dimensional (3D) nanofabrication. It is built on a pallet that can be loaded into the EBL apparatus, and rotates a sample while the e-beam writes on it. It has a positional accuracy of a few milliradians. In addition, a height-measurement system has also been developed. This helps to focus the e-beam on the surface of a rotating or non-planar sample, and enables fine patterns to be formed on such samples. These systems allow samples to be exposed to the e-beam from various directions, resulting in 3D fabrication with a high degree of freedom. A demonstration carried out on a polymethylmethacrylate sphere resulted in the formation of pillars with various shapes and about 100 nm in diameter.

Original languageEnglish
Pages (from-to)85-89
Number of pages5
JournalMicroelectronic Engineering
Publication statusPublished - Jun 2004
EventMicro and Nano Engineering 2003 - Cambridge, United Kingdom
Duration: Sept 22 2003Sept 25 2003


  • 3D nanofabrication
  • PMMA
  • Rotation drive
  • e-beam nanolithography

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering


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