Two-axis-of-rotation drive system in electron-beam lithography apparatus for nanotechnology applications

K. Yamazaki, H. Namatsu

Research output: Contribution to journalArticle

22 Citations (Scopus)

Abstract

A two-axis-of-rotation drive system has been developed that enables electron-beam lithography (EBL) to be applied to three-dimensional (3D) nanofabrication. It is built on a pallet that can be loaded into the EBL apparatus, and rotates a sample while the e-beam writes on it. It has a positional accuracy of a few milliradians. In addition, a height-measurement system has also been developed. This helps to focus the e-beam on the surface of a rotating or non-planar sample, and enables fine patterns to be formed on such samples. These systems allow samples to be exposed to the e-beam from various directions, resulting in 3D fabrication with a high degree of freedom. A demonstration carried out on a polymethylmethacrylate sphere resulted in the formation of pillars with various shapes and about 100 nm in diameter.

Original languageEnglish
Pages (from-to)85-89
Number of pages5
JournalMicroelectronic Engineering
Volume73-74
DOIs
Publication statusPublished - Jun 2004
Externally publishedYes

Fingerprint

axes of rotation
Electron beam lithography
nanotechnology
Nanotechnology
lithography
electron beams
Pallets
Polymethyl Methacrylate
Demonstrations
Fabrication
nanofabrication
degrees of freedom
fabrication
Direction compound

Keywords

  • 3D nanofabrication
  • e-beam nanolithography
  • PMMA
  • Rotation drive

ASJC Scopus subject areas

  • Hardware and Architecture
  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Surfaces, Coatings and Films
  • Atomic and Molecular Physics, and Optics

Cite this

Two-axis-of-rotation drive system in electron-beam lithography apparatus for nanotechnology applications. / Yamazaki, K.; Namatsu, H.

In: Microelectronic Engineering, Vol. 73-74, 06.2004, p. 85-89.

Research output: Contribution to journalArticle

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