Abstract
A two-axis-of-rotation drive system has been developed that enables electron-beam lithography (EBL) to be applied to three-dimensional (3D) nanofabrication. It is built on a pallet that can be loaded into the EBL apparatus, and rotates a sample while the e-beam writes on it. It has a positional accuracy of a few milliradians. In addition, a height-measurement system has also been developed. This helps to focus the e-beam on the surface of a rotating or non-planar sample, and enables fine patterns to be formed on such samples. These systems allow samples to be exposed to the e-beam from various directions, resulting in 3D fabrication with a high degree of freedom. A demonstration carried out on a polymethylmethacrylate sphere resulted in the formation of pillars with various shapes and about 100 nm in diameter.
| Original language | English |
|---|---|
| Pages (from-to) | 85-89 |
| Number of pages | 5 |
| Journal | Microelectronic Engineering |
| Volume | 73-74 |
| DOIs | |
| Publication status | Published - Jun 2004 |
| Event | Micro and Nano Engineering 2003 - Cambridge, United Kingdom Duration: Sept 22 2003 → Sept 25 2003 |
Keywords
- 3D nanofabrication
- PMMA
- Rotation drive
- e-beam nanolithography
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Atomic and Molecular Physics, and Optics
- Condensed Matter Physics
- Surfaces, Coatings and Films
- Electrical and Electronic Engineering