TiO                         2                         -based superhydrophobic-superhydrophilic patterns: Fabrication via an ink-jet technique and application in offset printing

Shunsuke Nishimoto; Atsushi Kubo; Kenji Nohara; Xintong Zhang; Noriaki Taneichi; Toshiki Okui; Zhaoyue Liu; Kazuya Nakata; Hideki Sakai; Taketoshi Murakami; Masahiko Abe; Takashi Komine; Akira Fujishima

doi:10.1016/j.apsusc.2009.01.084

TiO ₂ -based superhydrophobic-superhydrophilic patterns: Fabrication via an ink-jet technique and application in offset printing

Shunsuke Nishimoto, Atsushi Kubo, Kenji Nohara, Xintong Zhang, Noriaki Taneichi, Toshiki Okui, Zhaoyue Liu, Kazuya Nakata, Hideki Sakai, Taketoshi Murakami, Masahiko Abe, Takashi Komine, Akira Fujishima

Research output: Contribution to journal › Article › peer-review

94 Citations (Scopus)

Abstract

A superhydrophobic-superhydrophilic pattern was prepared on an anodized Al plate by a new fabrication process. The process consists of five key steps: (1) TiO ₂ coating of the plate, (2) surface modification with self-assembled monolayers (SAMs), (3) formation of aqueous UV light-resistant ink patterns by an ink-jet technique, (4) photocatalytic decomposition of SAMs and surface conversion to the superhydrophilic state and (5) removal of the aqueous ink patterns by water washing. It is particularly noteworthy that the wettability pattern can be quickly formed on the plate, without the use of a photomask. The fabricated superhydrophobic-superhydrophilic pattern is shown to be applicable to offset printing.

Original language	English
Pages (from-to)	6221-6225
Number of pages	5
Journal	Applied Surface Science
Volume	255
Issue number	12
DOIs	https://doi.org/10.1016/j.apsusc.2009.01.084
Publication status	Published - Apr 1 2009
Externally published	Yes

Keywords

Ink-jet technique
Offset printing
Self-assembled monolayers
Superhydrophobic-superhydrophilic
TiO photocatalyst

ASJC Scopus subject areas

Chemistry(all)
Condensed Matter Physics
Physics and Astronomy(all)
Surfaces and Interfaces
Surfaces, Coatings and Films

Access to Document

10.1016/j.apsusc.2009.01.084

Cite this

Nishimoto, S., Kubo, A., Nohara, K., Zhang, X., Taneichi, N., Okui, T., Liu, Z., Nakata, K., Sakai, H., Murakami, T., Abe, M., Komine, T., & Fujishima, A. (2009). TiO ₂ -based superhydrophobic-superhydrophilic patterns: Fabrication via an ink-jet technique and application in offset printing. Applied Surface Science, 255(12), 6221-6225. https://doi.org/10.1016/j.apsusc.2009.01.084

TiO ₂ -based superhydrophobic-superhydrophilic patterns : Fabrication via an ink-jet technique and application in offset printing. / Nishimoto, Shunsuke; Kubo, Atsushi; Nohara, Kenji; Zhang, Xintong; Taneichi, Noriaki; Okui, Toshiki; Liu, Zhaoyue; Nakata, Kazuya; Sakai, Hideki; Murakami, Taketoshi; Abe, Masahiko; Komine, Takashi; Fujishima, Akira.

In: Applied Surface Science, Vol. 255, No. 12, 01.04.2009, p. 6221-6225.

Research output: Contribution to journal › Article › peer-review

Nishimoto, S, Kubo, A, Nohara, K, Zhang, X, Taneichi, N, Okui, T, Liu, Z, Nakata, K, Sakai, H, Murakami, T, Abe, M, Komine, T & Fujishima, A 2009, 'TiO ₂ -based superhydrophobic-superhydrophilic patterns: Fabrication via an ink-jet technique and application in offset printing', Applied Surface Science, vol. 255, no. 12, pp. 6221-6225. https://doi.org/10.1016/j.apsusc.2009.01.084

Nishimoto, Shunsuke ; Kubo, Atsushi ; Nohara, Kenji ; Zhang, Xintong ; Taneichi, Noriaki ; Okui, Toshiki ; Liu, Zhaoyue ; Nakata, Kazuya ; Sakai, Hideki ; Murakami, Taketoshi ; Abe, Masahiko ; Komine, Takashi ; Fujishima, Akira. / TiO ₂ -based superhydrophobic-superhydrophilic patterns : Fabrication via an ink-jet technique and application in offset printing. In: Applied Surface Science. 2009 ; Vol. 255, No. 12. pp. 6221-6225.

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abstract = " A superhydrophobic-superhydrophilic pattern was prepared on an anodized Al plate by a new fabrication process. The process consists of five key steps: (1) TiO 2 coating of the plate, (2) surface modification with self-assembled monolayers (SAMs), (3) formation of aqueous UV light-resistant ink patterns by an ink-jet technique, (4) photocatalytic decomposition of SAMs and surface conversion to the superhydrophilic state and (5) removal of the aqueous ink patterns by water washing. It is particularly noteworthy that the wettability pattern can be quickly formed on the plate, without the use of a photomask. The fabricated superhydrophobic-superhydrophilic pattern is shown to be applicable to offset printing.",

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