TiO                         2                         -based superhydrophobic-superhydrophilic patterns: Fabrication via an ink-jet technique and application in offset printing

Shunsuke Nishimoto; Atsushi Kubo; Kenji Nohara; Xintong Zhang; Noriaki Taneichi; Toshiki Okui; Zhaoyue Liu; Kazuya Nakata; Hideki Sakai; Taketoshi Murakami; Masahiko Abe; Takashi Komine; Akira Fujishima

doi:10.1016/j.apsusc.2009.01.084

TiO ₂ -based superhydrophobic-superhydrophilic patterns: Fabrication via an ink-jet technique and application in offset printing

Shunsuke Nishimoto, Atsushi Kubo, Kenji Nohara, Xintong Zhang, Noriaki Taneichi, Toshiki Okui, Zhaoyue Liu, Kazuya Nakata, Hideki Sakai, Taketoshi Murakami, Masahiko Abe, Takashi Komine, Akira Fujishima

Research output: Contribution to journal › Article › peer-review

101 Citations (Scopus)

Abstract

A superhydrophobic-superhydrophilic pattern was prepared on an anodized Al plate by a new fabrication process. The process consists of five key steps: (1) TiO ₂ coating of the plate, (2) surface modification with self-assembled monolayers (SAMs), (3) formation of aqueous UV light-resistant ink patterns by an ink-jet technique, (4) photocatalytic decomposition of SAMs and surface conversion to the superhydrophilic state and (5) removal of the aqueous ink patterns by water washing. It is particularly noteworthy that the wettability pattern can be quickly formed on the plate, without the use of a photomask. The fabricated superhydrophobic-superhydrophilic pattern is shown to be applicable to offset printing.

Original language	English
Pages (from-to)	6221-6225
Number of pages	5
Journal	Applied Surface Science
Volume	255
Issue number	12
DOIs	https://doi.org/10.1016/j.apsusc.2009.01.084
Publication status	Published - Apr 1 2009
Externally published	Yes

Keywords

Ink-jet technique
Offset printing
Self-assembled monolayers
Superhydrophobic-superhydrophilic
TiO photocatalyst

ASJC Scopus subject areas

Chemistry(all)
Condensed Matter Physics
Physics and Astronomy(all)
Surfaces and Interfaces
Surfaces, Coatings and Films

Access to Document

10.1016/j.apsusc.2009.01.084

Cite this

Nishimoto, S., Kubo, A., Nohara, K., Zhang, X., Taneichi, N., Okui, T., Liu, Z., Nakata, K., Sakai, H., Murakami, T., Abe, M., Komine, T., & Fujishima, A. (2009). TiO ₂ -based superhydrophobic-superhydrophilic patterns: Fabrication via an ink-jet technique and application in offset printing. Applied Surface Science, 255(12), 6221-6225. https://doi.org/10.1016/j.apsusc.2009.01.084

TiO ₂ -based superhydrophobic-superhydrophilic patterns : Fabrication via an ink-jet technique and application in offset printing. / Nishimoto, Shunsuke; Kubo, Atsushi; Nohara, Kenji et al.

In: Applied Surface Science, Vol. 255, No. 12, 01.04.2009, p. 6221-6225.

Research output: Contribution to journal › Article › peer-review

Nishimoto, S, Kubo, A, Nohara, K, Zhang, X, Taneichi, N, Okui, T, Liu, Z, Nakata, K, Sakai, H, Murakami, T, Abe, M, Komine, T & Fujishima, A 2009, 'TiO ₂ -based superhydrophobic-superhydrophilic patterns: Fabrication via an ink-jet technique and application in offset printing', Applied Surface Science, vol. 255, no. 12, pp. 6221-6225. https://doi.org/10.1016/j.apsusc.2009.01.084

@article{7a97d7226078416c872d936dbcbf5be1,

title = "TiO 2 -based superhydrophobic-superhydrophilic patterns: Fabrication via an ink-jet technique and application in offset printing",

abstract = " A superhydrophobic-superhydrophilic pattern was prepared on an anodized Al plate by a new fabrication process. The process consists of five key steps: (1) TiO 2 coating of the plate, (2) surface modification with self-assembled monolayers (SAMs), (3) formation of aqueous UV light-resistant ink patterns by an ink-jet technique, (4) photocatalytic decomposition of SAMs and surface conversion to the superhydrophilic state and (5) removal of the aqueous ink patterns by water washing. It is particularly noteworthy that the wettability pattern can be quickly formed on the plate, without the use of a photomask. The fabricated superhydrophobic-superhydrophilic pattern is shown to be applicable to offset printing.",

keywords = "Ink-jet technique, Offset printing, Self-assembled monolayers, Superhydrophobic-superhydrophilic, TiO photocatalyst",

author = "Shunsuke Nishimoto and Atsushi Kubo and Kenji Nohara and Xintong Zhang and Noriaki Taneichi and Toshiki Okui and Zhaoyue Liu and Kazuya Nakata and Hideki Sakai and Taketoshi Murakami and Masahiko Abe and Takashi Komine and Akira Fujishima",

year = "2009",

month = apr,

day = "1",

doi = "10.1016/j.apsusc.2009.01.084",

language = "English",

volume = "255",

pages = "6221--6225",

journal = "Applied Surface Science",

issn = "0169-4332",

publisher = "Elsevier",

number = "12",

}

TY - JOUR

T1 - TiO 2 -based superhydrophobic-superhydrophilic patterns

T2 - Fabrication via an ink-jet technique and application in offset printing

AU - Nishimoto, Shunsuke

AU - Kubo, Atsushi

AU - Nohara, Kenji

AU - Zhang, Xintong

AU - Taneichi, Noriaki

AU - Okui, Toshiki

AU - Liu, Zhaoyue

AU - Nakata, Kazuya

AU - Sakai, Hideki

AU - Murakami, Taketoshi

AU - Abe, Masahiko

AU - Komine, Takashi

AU - Fujishima, Akira

PY - 2009/4/1

Y1 - 2009/4/1

N2 - A superhydrophobic-superhydrophilic pattern was prepared on an anodized Al plate by a new fabrication process. The process consists of five key steps: (1) TiO 2 coating of the plate, (2) surface modification with self-assembled monolayers (SAMs), (3) formation of aqueous UV light-resistant ink patterns by an ink-jet technique, (4) photocatalytic decomposition of SAMs and surface conversion to the superhydrophilic state and (5) removal of the aqueous ink patterns by water washing. It is particularly noteworthy that the wettability pattern can be quickly formed on the plate, without the use of a photomask. The fabricated superhydrophobic-superhydrophilic pattern is shown to be applicable to offset printing.

AB - A superhydrophobic-superhydrophilic pattern was prepared on an anodized Al plate by a new fabrication process. The process consists of five key steps: (1) TiO 2 coating of the plate, (2) surface modification with self-assembled monolayers (SAMs), (3) formation of aqueous UV light-resistant ink patterns by an ink-jet technique, (4) photocatalytic decomposition of SAMs and surface conversion to the superhydrophilic state and (5) removal of the aqueous ink patterns by water washing. It is particularly noteworthy that the wettability pattern can be quickly formed on the plate, without the use of a photomask. The fabricated superhydrophobic-superhydrophilic pattern is shown to be applicable to offset printing.

KW - Ink-jet technique

KW - Offset printing

KW - Self-assembled monolayers

KW - Superhydrophobic-superhydrophilic

KW - TiO photocatalyst

UR - http://www.scopus.com/inward/record.url?scp=62349093596&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=62349093596&partnerID=8YFLogxK

U2 - 10.1016/j.apsusc.2009.01.084

DO - 10.1016/j.apsusc.2009.01.084

M3 - Article

AN - SCOPUS:62349093596

SN - 0169-4332

VL - 255

SP - 6221

EP - 6225

JO - Applied Surface Science

JF - Applied Surface Science

IS - 12

ER -