TiO 2 -based superhydrophobic-superhydrophilic patterns: Fabrication via an ink-jet technique and application in offset printing

Shunsuke Nishimoto, Atsushi Kubo, Kenji Nohara, Xintong Zhang, Noriaki Taneichi, Toshiki Okui, Zhaoyue Liu, Kazuya Nakata, Hideki Sakai, Taketoshi Murakami, Masahiko Abe, Takashi Komine, Akira Fujishima

Research output: Contribution to journalArticlepeer-review

101 Citations (Scopus)

Abstract

A superhydrophobic-superhydrophilic pattern was prepared on an anodized Al plate by a new fabrication process. The process consists of five key steps: (1) TiO 2 coating of the plate, (2) surface modification with self-assembled monolayers (SAMs), (3) formation of aqueous UV light-resistant ink patterns by an ink-jet technique, (4) photocatalytic decomposition of SAMs and surface conversion to the superhydrophilic state and (5) removal of the aqueous ink patterns by water washing. It is particularly noteworthy that the wettability pattern can be quickly formed on the plate, without the use of a photomask. The fabricated superhydrophobic-superhydrophilic pattern is shown to be applicable to offset printing.

Original languageEnglish
Pages (from-to)6221-6225
Number of pages5
JournalApplied Surface Science
Volume255
Issue number12
DOIs
Publication statusPublished - Apr 1 2009
Externally publishedYes

Keywords

  • Ink-jet technique
  • Offset printing
  • Self-assembled monolayers
  • Superhydrophobic-superhydrophilic
  • TiO photocatalyst

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Physics and Astronomy(all)
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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