Three-dimensional siloxane resist for the formation of nanopatterns with minimum linewidth fluctuations

Hideo Namatsu, Yasuo Takahashi, Kenji Yamazaki, Toru Yamaguchi, Masao Nagase, Kenji Kurihara

Research output: Contribution to journalArticlepeer-review

265 Citations (Scopus)

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Physics & Astronomy

Engineering & Materials Science