Three-dimensional nanofabrication with 10-nm resolution

Kenji Yamazaki, Toru Yamaguchi, Hideo Namatsu

Research output: Contribution to journalArticle

26 Citations (Scopus)

Abstract

We have devised three-dimensional (3D) nanofabrication technology using electron-beam (EB) lithography and a sample-rotation drive. Ten-nm resolution of patterning over a 3D sample and 3D fabrication was achieved by precise control of beam focusing for patterns divided based on the depth of focus of the EB. The focus control is carried out using an offline height-measurement system we developed, which provides focusing error of less than 2 μm. The depth of focus was accurately derived using the wave optical method. We have demonstrated these techniques and the resulting resolution by making the world's smallest globe, which shows the minimum feature size of 10nm over the world map.

Original languageEnglish
JournalJapanese Journal of Applied Physics, Part 2: Letters
Volume43
Issue number8 B
DOIs
Publication statusPublished - Aug 15 2004
Externally publishedYes

Fingerprint

nanofabrication
Nanotechnology
Electron beam lithography
electron beams
Electron beams
globes
Fabrication
lithography
optics
fabrication

Keywords

  • Depth of focus
  • Electron-beam lithography
  • Nano-globe
  • Three-dimensional nanofabrication

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

Three-dimensional nanofabrication with 10-nm resolution. / Yamazaki, Kenji; Yamaguchi, Toru; Namatsu, Hideo.

In: Japanese Journal of Applied Physics, Part 2: Letters, Vol. 43, No. 8 B, 15.08.2004.

Research output: Contribution to journalArticle

Yamazaki, Kenji ; Yamaguchi, Toru ; Namatsu, Hideo. / Three-dimensional nanofabrication with 10-nm resolution. In: Japanese Journal of Applied Physics, Part 2: Letters. 2004 ; Vol. 43, No. 8 B.
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