Three-dimensional nanofabrication in si using electron beam lithography

Kenji Yamazaki, Hiroshi Yamaguchi

Research output: Contribution to journalArticle

Abstract

A new technique for fabricating three-dimensional (3D) nanostructures enables us to create various 3D nanodevices. The technique involves using electron beam (EB) writing from various directions on microstructures. New methods of resist coating on microstructures and etching parallel to the substrate surface make it possible to apply the 3D-EB writing to 3D nanofabrication in various materials, including Si and hard materials. This technique was used to create 3D Si nanostructures at high resolution and with a high fabrication speed and large arbitrariness in the types of 3D structures that can be created. The technique is therefore promising for creating 3D nanodevices in various nanotechnology fields such as nanomechanics and metamaterials.

Original languageEnglish
JournalNTT Technical Review
Volume12
Issue number2
Publication statusPublished - Feb 2014
Externally publishedYes

Fingerprint

Electron beam lithography
Nanotechnology
Electron beams
Nanostructures
Nanomechanics
Microstructure
Metamaterials
Etching
Fabrication
Coatings
Substrates

Keywords

  • 3D nanostructure
  • EB writing
  • Nanomechanical device

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Computer Networks and Communications
  • Computer Science Applications

Cite this

Three-dimensional nanofabrication in si using electron beam lithography. / Yamazaki, Kenji; Yamaguchi, Hiroshi.

In: NTT Technical Review, Vol. 12, No. 2, 02.2014.

Research output: Contribution to journalArticle

Yamazaki, Kenji ; Yamaguchi, Hiroshi. / Three-dimensional nanofabrication in si using electron beam lithography. In: NTT Technical Review. 2014 ; Vol. 12, No. 2.
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