Three-dimensional nanofabrication (3D-NANO) down to 10-NM order using electron-beam lithography

K. Yamazaki, H. Namatsu

Research output: Contribution to journalConference article

4 Citations (Scopus)

Abstract

We have devised a new technology for 10-nm-order three-dimensional nanofabrication (3D-NANO) by electron-beam nanolithography (EBL) that involves repeating the e-beam exposure, rotation, and if necessary, other processes like development and etching. 3D-NANO was achieved through the combination of a rotation drive in the EBL apparatus, a focusing system, and a beam positioning method that uses the transmission signal to provide an accuracy of 10-nm order. The fabrication of a nanofilter and nanopillars on a sphere have demonstrated that our 3D-NANO technique can create 3D structures with a resolution on the order of 10 nm and a high degree of freedom. It should have many applications in biology, chemistry, medicine, nanoelectronics, and nano-machining.

Original languageEnglish
Pages (from-to)609-612
Number of pages4
JournalProceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)
Publication statusPublished - Jul 19 2004
Event17th IEEE International Conference on Micro Electro Mechanical Systems (MEMS): Maastricht MEMS 2004 Technical Digest - Maastricht, Netherlands
Duration: Jan 25 2004Jan 29 2004

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Mechanical Engineering
  • Electrical and Electronic Engineering

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