Three-dimensional alignment with 10 nm order accuracy in electron-beam lithography on rotated sample for three-dimensional nanofabrication

Kenji Yamazaki, Hiroshi Yamaguchi

Research output: Contribution to journalArticle

11 Citations (Scopus)

Abstract

Three-dimensional (3D) alignment with 10 nm order accuracy in 3D electron-beam (EB) lithography has been achieved by means of highly accurate rotation control and mark location using the transmission electron signal. Accurately aligned EB writing from various directions on micron order resists blocks on a small substrate provides great structural flexibility in the creation of 3D nanostructures. As a demonstration of the accuracy, a 3D hydrogen silsesquioxane nanostructure was made by 3D EB writing and two-step development using different developers. Moreover, a 3D poly(methyl methacrylate) nanostructure was made by repeated 3D EB writing and development to demonstrate 3D nanofabrication with great structural flexibility.

Original languageEnglish
Pages (from-to)2529-2533
Number of pages5
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume26
Issue number6
DOIs
Publication statusPublished - 2008
Externally publishedYes

Fingerprint

Electron beam lithography
nanofabrication
Nanotechnology
Electron beams
Nanostructures
lithography
alignment
electron beams
flexibility
Polymethyl methacrylates
photographic developers
Demonstrations
polymethyl methacrylate
Hydrogen
Electrons
Substrates
hydrogen
electrons

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

Cite this

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abstract = "Three-dimensional (3D) alignment with 10 nm order accuracy in 3D electron-beam (EB) lithography has been achieved by means of highly accurate rotation control and mark location using the transmission electron signal. Accurately aligned EB writing from various directions on micron order resists blocks on a small substrate provides great structural flexibility in the creation of 3D nanostructures. As a demonstration of the accuracy, a 3D hydrogen silsesquioxane nanostructure was made by 3D EB writing and two-step development using different developers. Moreover, a 3D poly(methyl methacrylate) nanostructure was made by repeated 3D EB writing and development to demonstrate 3D nanofabrication with great structural flexibility.",
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