Theoretical simulation of extreme UV radiation source for lithography

K. Fujima, K. Nishihara, T. Kawamura, H. Furukawa, T. Kagawa, F. Koike, R. More, M. Murakami, T. Nishikawa, A. Sasaki, A. Sunahara, V. Zhakhovskii, T. Fujimoto, H. Tanuma

Research output: Contribution to journalConference article

3 Citations (Scopus)

Abstract

A possible design window for extreme ultraviolet (EUV) radiation source has been introduced, which is needed for its realistic use for next generation lithography. For this goal, we have prepared a set of numerical simulation codes to estimate the conversion efficiency from laser energy to radiation energy with a wavelength of 13.5 nm with 2% bandwidth, which includes atomic structure, opacity and emissibity and hydro dynamics codes. The simulation explains well the observed conversion efficiency dependence of incident power using GEKKO XII laser system as well as spectral shapes. It is found that the conversion efficiency into 13.5 nm at 2% bandwidth has its maximum of a few percent at the laser intensity 1-2 × 10 11 W/cm 2.

Original languageEnglish
Pages (from-to)405-412
Number of pages8
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume5374
Issue numberPART 1
DOIs
Publication statusPublished - 2004
EventEmerging Lithographic Technologies VIII - Santa Clara, CA, United States
Duration: Feb 24 2004Feb 26 2004

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Fingerprint Dive into the research topics of 'Theoretical simulation of extreme UV radiation source for lithography'. Together they form a unique fingerprint.

  • Cite this

    Fujima, K., Nishihara, K., Kawamura, T., Furukawa, H., Kagawa, T., Koike, F., More, R., Murakami, M., Nishikawa, T., Sasaki, A., Sunahara, A., Zhakhovskii, V., Fujimoto, T., & Tanuma, H. (2004). Theoretical simulation of extreme UV radiation source for lithography. Proceedings of SPIE - The International Society for Optical Engineering, 5374(PART 1), 405-412. https://doi.org/10.1117/12.534989