Abstract
Extreme ultraviolet (EUV) radiation from laser-produced plasma has been thoroughly studied for application in mass-production of the next generation semiconductor devices. Comprehensive experimental databases are provided for a wide range of parameters of lasers and targets. The atomic models are benchmarked with spectroscopic measurements not only for laser-produced plasma (LPP) but also for EUV emissions from magnetic-confinement plasmas or the charge exchange for uniquely ionized ions colliding with rare-gas targets. These experimental data are utilized in the industry as well as used to benchmark the radiation hydrodynamic code, including equation-of-state solvers and advanced atomic kinetic models, dedicated for EUV plasma predictions. Present status of the LPP EUV source studies is presented.
Original language | English |
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Title of host publication | Atomic Processes in Plasmas - 15th International Conference on Atomic Processes in Plasmas, APiP |
Pages | 270-280 |
Number of pages | 11 |
DOIs | |
Publication status | Published - 2007 |
Event | 15th International Conference on Atomic Processes in Plasmas, APiP - Gaithersburg, MD, United States Duration: Mar 19 2007 → Mar 22 2007 |
Publication series
Name | AIP Conference Proceedings |
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Volume | 926 |
ISSN (Print) | 0094-243X |
ISSN (Electronic) | 1551-7616 |
Other
Other | 15th International Conference on Atomic Processes in Plasmas, APiP |
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Country/Territory | United States |
City | Gaithersburg, MD |
Period | 3/19/07 → 3/22/07 |
Keywords
- Charge-exchange spectroscopy
- Extreme Ultraviolet (EUV)
- Laser produced tin plasma
- Tin opacity
ASJC Scopus subject areas
- Physics and Astronomy(all)