Abstract
Extreme ultraviolet (EUV) radiation from laser-produced plasma has been thoroughly studied for application in mass-production of the next generation semiconductor devices. Comprehensive experimental databases are provided for a wide range of parameters of lasers and targets. The atomic models are benchmarked with spectroscopic measurements not only for laser-produced plasma (LPP) but also for EUV emissions from magnetic-confinement plasmas or the charge exchange for uniquely ionized ions colliding with rare-gas targets. These experimental data are utilized in the industry as well as used to benchmark the radiation hydrodynamic code, including equation-of-state solvers and advanced atomic kinetic models, dedicated for EUV plasma predictions. Present status of the LPP EUV source studies is presented.
| Original language | English |
|---|---|
| Title of host publication | AIP Conference Proceedings |
| Pages | 270-280 |
| Number of pages | 11 |
| Volume | 926 |
| DOIs | |
| Publication status | Published - 2007 |
| Externally published | Yes |
| Event | 15th International Conference on Atomic Processes in Plasmas, APiP - Gaithersburg, MD, United States Duration: Mar 19 2007 → Mar 22 2007 |
Other
| Other | 15th International Conference on Atomic Processes in Plasmas, APiP |
|---|---|
| Country | United States |
| City | Gaithersburg, MD |
| Period | 3/19/07 → 3/22/07 |
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Keywords
- Charge-exchange spectroscopy
- Extreme Ultraviolet (EUV)
- Laser produced tin plasma
- Tin opacity
ASJC Scopus subject areas
- Physics and Astronomy(all)
Cite this
Theoretical and experimental databases for high average power EUV light source by laser produced plasma. / Nishimura, H.; Nishihara, K.; Fujioka, S.; Aota, T.; Ando, T.; Shimomura, M.; Sakaguchi, K.; Simada, Y.; Yamaura, M.; Nagai, K.; Norimatsu, T.; Sunahara, A.; Murakami, M.; Sasaki, A.; Tanuma, H.; Koike, F.; Fuijma, K.; Suzuki, C.; Morita, S.; Kato, T.; Kagawa, T.; Nishikawa, Takeshi; Miyanaga, N.; Izawa, Y.; Mima, K.
AIP Conference Proceedings. Vol. 926 2007. p. 270-280.Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
}
TY - GEN
T1 - Theoretical and experimental databases for high average power EUV light source by laser produced plasma
AU - Nishimura, H.
AU - Nishihara, K.
AU - Fujioka, S.
AU - Aota, T.
AU - Ando, T.
AU - Shimomura, M.
AU - Sakaguchi, K.
AU - Simada, Y.
AU - Yamaura, M.
AU - Nagai, K.
AU - Norimatsu, T.
AU - Sunahara, A.
AU - Murakami, M.
AU - Sasaki, A.
AU - Tanuma, H.
AU - Koike, F.
AU - Fuijma, K.
AU - Suzuki, C.
AU - Morita, S.
AU - Kato, T.
AU - Kagawa, T.
AU - Nishikawa, Takeshi
AU - Miyanaga, N.
AU - Izawa, Y.
AU - Mima, K.
PY - 2007
Y1 - 2007
N2 - Extreme ultraviolet (EUV) radiation from laser-produced plasma has been thoroughly studied for application in mass-production of the next generation semiconductor devices. Comprehensive experimental databases are provided for a wide range of parameters of lasers and targets. The atomic models are benchmarked with spectroscopic measurements not only for laser-produced plasma (LPP) but also for EUV emissions from magnetic-confinement plasmas or the charge exchange for uniquely ionized ions colliding with rare-gas targets. These experimental data are utilized in the industry as well as used to benchmark the radiation hydrodynamic code, including equation-of-state solvers and advanced atomic kinetic models, dedicated for EUV plasma predictions. Present status of the LPP EUV source studies is presented.
AB - Extreme ultraviolet (EUV) radiation from laser-produced plasma has been thoroughly studied for application in mass-production of the next generation semiconductor devices. Comprehensive experimental databases are provided for a wide range of parameters of lasers and targets. The atomic models are benchmarked with spectroscopic measurements not only for laser-produced plasma (LPP) but also for EUV emissions from magnetic-confinement plasmas or the charge exchange for uniquely ionized ions colliding with rare-gas targets. These experimental data are utilized in the industry as well as used to benchmark the radiation hydrodynamic code, including equation-of-state solvers and advanced atomic kinetic models, dedicated for EUV plasma predictions. Present status of the LPP EUV source studies is presented.
KW - Charge-exchange spectroscopy
KW - Extreme Ultraviolet (EUV)
KW - Laser produced tin plasma
KW - Tin opacity
UR - http://www.scopus.com/inward/record.url?scp=77958006647&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=77958006647&partnerID=8YFLogxK
U2 - 10.1063/1.2768859
DO - 10.1063/1.2768859
M3 - Conference contribution
SN - 9780735404366
VL - 926
SP - 270
EP - 280
BT - AIP Conference Proceedings
ER -