Theoretical and experimental databases for high average power EUV light source by laser produced plasma

H. Nishimura, K. Nishihara, S. Fujioka, T. Aota, T. Ando, M. Shimomura, K. Sakaguchi, Y. Simada, M. Yamaura, K. Nagai, T. Norimatsu, A. Sunahara, M. Murakami, A. Sasaki, H. Tanuma, F. Koike, K. Fuijma, C. Suzuki, S. Morita, T. Kato & 5 others T. Kagawa, Takeshi Nishikawa, N. Miyanaga, Y. Izawa, K. Mima

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Extreme ultraviolet (EUV) radiation from laser-produced plasma has been thoroughly studied for application in mass-production of the next generation semiconductor devices. Comprehensive experimental databases are provided for a wide range of parameters of lasers and targets. The atomic models are benchmarked with spectroscopic measurements not only for laser-produced plasma (LPP) but also for EUV emissions from magnetic-confinement plasmas or the charge exchange for uniquely ionized ions colliding with rare-gas targets. These experimental data are utilized in the industry as well as used to benchmark the radiation hydrodynamic code, including equation-of-state solvers and advanced atomic kinetic models, dedicated for EUV plasma predictions. Present status of the LPP EUV source studies is presented.

Original languageEnglish
Title of host publicationAIP Conference Proceedings
Pages270-280
Number of pages11
Volume926
DOIs
Publication statusPublished - 2007
Externally publishedYes
Event15th International Conference on Atomic Processes in Plasmas, APiP - Gaithersburg, MD, United States
Duration: Mar 19 2007Mar 22 2007

Other

Other15th International Conference on Atomic Processes in Plasmas, APiP
CountryUnited States
CityGaithersburg, MD
Period3/19/073/22/07

Fingerprint

laser plasmas
ultraviolet radiation
light sources
extreme ultraviolet radiation
plasma control
ultraviolet emission
semiconductor devices
charge exchange
rare gases
equations of state
industries
hydrodynamics
kinetics
radiation
predictions
lasers
ions

Keywords

  • Charge-exchange spectroscopy
  • Extreme Ultraviolet (EUV)
  • Laser produced tin plasma
  • Tin opacity

ASJC Scopus subject areas

  • Physics and Astronomy(all)

Cite this

Nishimura, H., Nishihara, K., Fujioka, S., Aota, T., Ando, T., Shimomura, M., ... Mima, K. (2007). Theoretical and experimental databases for high average power EUV light source by laser produced plasma. In AIP Conference Proceedings (Vol. 926, pp. 270-280) https://doi.org/10.1063/1.2768859

Theoretical and experimental databases for high average power EUV light source by laser produced plasma. / Nishimura, H.; Nishihara, K.; Fujioka, S.; Aota, T.; Ando, T.; Shimomura, M.; Sakaguchi, K.; Simada, Y.; Yamaura, M.; Nagai, K.; Norimatsu, T.; Sunahara, A.; Murakami, M.; Sasaki, A.; Tanuma, H.; Koike, F.; Fuijma, K.; Suzuki, C.; Morita, S.; Kato, T.; Kagawa, T.; Nishikawa, Takeshi; Miyanaga, N.; Izawa, Y.; Mima, K.

AIP Conference Proceedings. Vol. 926 2007. p. 270-280.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Nishimura, H, Nishihara, K, Fujioka, S, Aota, T, Ando, T, Shimomura, M, Sakaguchi, K, Simada, Y, Yamaura, M, Nagai, K, Norimatsu, T, Sunahara, A, Murakami, M, Sasaki, A, Tanuma, H, Koike, F, Fuijma, K, Suzuki, C, Morita, S, Kato, T, Kagawa, T, Nishikawa, T, Miyanaga, N, Izawa, Y & Mima, K 2007, Theoretical and experimental databases for high average power EUV light source by laser produced plasma. in AIP Conference Proceedings. vol. 926, pp. 270-280, 15th International Conference on Atomic Processes in Plasmas, APiP, Gaithersburg, MD, United States, 3/19/07. https://doi.org/10.1063/1.2768859
Nishimura H, Nishihara K, Fujioka S, Aota T, Ando T, Shimomura M et al. Theoretical and experimental databases for high average power EUV light source by laser produced plasma. In AIP Conference Proceedings. Vol. 926. 2007. p. 270-280 https://doi.org/10.1063/1.2768859
Nishimura, H. ; Nishihara, K. ; Fujioka, S. ; Aota, T. ; Ando, T. ; Shimomura, M. ; Sakaguchi, K. ; Simada, Y. ; Yamaura, M. ; Nagai, K. ; Norimatsu, T. ; Sunahara, A. ; Murakami, M. ; Sasaki, A. ; Tanuma, H. ; Koike, F. ; Fuijma, K. ; Suzuki, C. ; Morita, S. ; Kato, T. ; Kagawa, T. ; Nishikawa, Takeshi ; Miyanaga, N. ; Izawa, Y. ; Mima, K. / Theoretical and experimental databases for high average power EUV light source by laser produced plasma. AIP Conference Proceedings. Vol. 926 2007. pp. 270-280
@inproceedings{542f476aa02747a796fb8e15fcfb2dc7,
title = "Theoretical and experimental databases for high average power EUV light source by laser produced plasma",
abstract = "Extreme ultraviolet (EUV) radiation from laser-produced plasma has been thoroughly studied for application in mass-production of the next generation semiconductor devices. Comprehensive experimental databases are provided for a wide range of parameters of lasers and targets. The atomic models are benchmarked with spectroscopic measurements not only for laser-produced plasma (LPP) but also for EUV emissions from magnetic-confinement plasmas or the charge exchange for uniquely ionized ions colliding with rare-gas targets. These experimental data are utilized in the industry as well as used to benchmark the radiation hydrodynamic code, including equation-of-state solvers and advanced atomic kinetic models, dedicated for EUV plasma predictions. Present status of the LPP EUV source studies is presented.",
keywords = "Charge-exchange spectroscopy, Extreme Ultraviolet (EUV), Laser produced tin plasma, Tin opacity",
author = "H. Nishimura and K. Nishihara and S. Fujioka and T. Aota and T. Ando and M. Shimomura and K. Sakaguchi and Y. Simada and M. Yamaura and K. Nagai and T. Norimatsu and A. Sunahara and M. Murakami and A. Sasaki and H. Tanuma and F. Koike and K. Fuijma and C. Suzuki and S. Morita and T. Kato and T. Kagawa and Takeshi Nishikawa and N. Miyanaga and Y. Izawa and K. Mima",
year = "2007",
doi = "10.1063/1.2768859",
language = "English",
isbn = "9780735404366",
volume = "926",
pages = "270--280",
booktitle = "AIP Conference Proceedings",

}

TY - GEN

T1 - Theoretical and experimental databases for high average power EUV light source by laser produced plasma

AU - Nishimura, H.

AU - Nishihara, K.

AU - Fujioka, S.

AU - Aota, T.

AU - Ando, T.

AU - Shimomura, M.

AU - Sakaguchi, K.

AU - Simada, Y.

AU - Yamaura, M.

AU - Nagai, K.

AU - Norimatsu, T.

AU - Sunahara, A.

AU - Murakami, M.

AU - Sasaki, A.

AU - Tanuma, H.

AU - Koike, F.

AU - Fuijma, K.

AU - Suzuki, C.

AU - Morita, S.

AU - Kato, T.

AU - Kagawa, T.

AU - Nishikawa, Takeshi

AU - Miyanaga, N.

AU - Izawa, Y.

AU - Mima, K.

PY - 2007

Y1 - 2007

N2 - Extreme ultraviolet (EUV) radiation from laser-produced plasma has been thoroughly studied for application in mass-production of the next generation semiconductor devices. Comprehensive experimental databases are provided for a wide range of parameters of lasers and targets. The atomic models are benchmarked with spectroscopic measurements not only for laser-produced plasma (LPP) but also for EUV emissions from magnetic-confinement plasmas or the charge exchange for uniquely ionized ions colliding with rare-gas targets. These experimental data are utilized in the industry as well as used to benchmark the radiation hydrodynamic code, including equation-of-state solvers and advanced atomic kinetic models, dedicated for EUV plasma predictions. Present status of the LPP EUV source studies is presented.

AB - Extreme ultraviolet (EUV) radiation from laser-produced plasma has been thoroughly studied for application in mass-production of the next generation semiconductor devices. Comprehensive experimental databases are provided for a wide range of parameters of lasers and targets. The atomic models are benchmarked with spectroscopic measurements not only for laser-produced plasma (LPP) but also for EUV emissions from magnetic-confinement plasmas or the charge exchange for uniquely ionized ions colliding with rare-gas targets. These experimental data are utilized in the industry as well as used to benchmark the radiation hydrodynamic code, including equation-of-state solvers and advanced atomic kinetic models, dedicated for EUV plasma predictions. Present status of the LPP EUV source studies is presented.

KW - Charge-exchange spectroscopy

KW - Extreme Ultraviolet (EUV)

KW - Laser produced tin plasma

KW - Tin opacity

UR - http://www.scopus.com/inward/record.url?scp=77958006647&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=77958006647&partnerID=8YFLogxK

U2 - 10.1063/1.2768859

DO - 10.1063/1.2768859

M3 - Conference contribution

SN - 9780735404366

VL - 926

SP - 270

EP - 280

BT - AIP Conference Proceedings

ER -