Extreme ultraviolet (EUV) radiation from laser-produced plasma has been thoroughly studied for application in mass-production of the next generation semiconductor devices. Comprehensive experimental databases are provided for a wide range of parameters of lasers and targets. The atomic models are benchmarked with spectroscopic measurements not only for laser-produced plasma (LPP) but also for EUV emissions from magnetic-confinement plasmas or the charge exchange for uniquely ionized ions colliding with rare-gas targets. These experimental data are utilized in the industry as well as used to benchmark the radiation hydrodynamic code, including equation-of-state solvers and advanced atomic kinetic models, dedicated for EUV plasma predictions. Present status of the LPP EUV source studies is presented.