The formation of a (111) texture of the diamond film on Pt/TiO2/SiOx/Si substrate by microwave plasma chemical vapor deposition

Yasuhiko Hayashi, Yoshinori Matsushita, Tetsuo Soga, Masayoshi Umeno, Takashi Jimbo

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

Heteroepitaxial diamond films were grown on Pt(111)/Si with a SiOx intermediate layer between them to prevent silicidation by microwave plasma enhanced chemical vapor deposition. We found that adhesion of Pt films could be improved by depositing a TiO2 thin film between Pt and SiOx. During the diamond growth, the change of preferred orientation of the Pt film was observed by X-ray diffraction (XRD) measurements. The films grown on a Pt(111)/SiOx/Si substrate had a (111)-oriented diamond with full-width at half-maximum (FWHM) values of 3-5° in XRD rocking curve of diamond(111) diffraction. Raman spectroscopy revealed that the FWHM of the diamond peak at 1332.8 cm-1 was approximately 7-10 cm-1 over the growth temperature range 700-850 °C. All the films contained disordered graphitic carbon components or an amorphous carbon phase.

Original languageEnglish
Pages (from-to)499-503
Number of pages5
JournalDiamond and Related Materials
Volume11
Issue number3-6
DOIs
Publication statusPublished - Mar 2002
Externally publishedYes

Fingerprint

Diamond
Diamond films
diamond films
Chemical vapor deposition
Diamonds
textures
Textures
diamonds
Microwaves
vapor deposition
Plasmas
microwaves
Substrates
Full width at half maximum
diffraction
X ray diffraction
carbon
Amorphous carbon
Growth temperature
Plasma enhanced chemical vapor deposition

Keywords

  • Diamond growth and characterization
  • Heteroepitaxial diamond
  • MPECVD
  • Pt/TiO/SiO/Si

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Materials Chemistry
  • Surfaces, Coatings and Films
  • Surfaces and Interfaces

Cite this

The formation of a (111) texture of the diamond film on Pt/TiO2/SiOx/Si substrate by microwave plasma chemical vapor deposition. / Hayashi, Yasuhiko; Matsushita, Yoshinori; Soga, Tetsuo; Umeno, Masayoshi; Jimbo, Takashi.

In: Diamond and Related Materials, Vol. 11, No. 3-6, 03.2002, p. 499-503.

Research output: Contribution to journalArticle

Hayashi, Yasuhiko ; Matsushita, Yoshinori ; Soga, Tetsuo ; Umeno, Masayoshi ; Jimbo, Takashi. / The formation of a (111) texture of the diamond film on Pt/TiO2/SiOx/Si substrate by microwave plasma chemical vapor deposition. In: Diamond and Related Materials. 2002 ; Vol. 11, No. 3-6. pp. 499-503.
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