The effect of an electrostatic force on imaging a surface topography by noncontact atomic force microscope

Tadashi Shiota, Keiji Nakayama

Research output: Contribution to journalLetter

13 Citations (Scopus)

Abstract

Noncontact atomic force microscope (NC-AFM) with and without scanning Kelvin probe force microscope (SKPM) has been studied to clarify the effect of an electrostatic force between a cantilever tip and a specimen on the NC-AFM imaging. The NC-AFM image contrast of a quenched Si(111) surface reflected the distribution of the surface potential, while that observed with a feedback of the SKPM signal showed good agreements with the previous results. The experimental results show that the electrostatic force affects the NC-AFM image formation, so that the electrostatic effect must be compensated to obtain an actual surface topography by NC-AFM.

Original languageEnglish
JournalJapanese Journal of Applied Physics, Part 2: Letters
Volume40
Issue number9 A/B
Publication statusPublished - Sep 15 2001
Externally publishedYes

Fingerprint

topography
microscopes
electrostatics
scanning
probes
image contrast

Keywords

  • AFM
  • CPD
  • Electrostatic force
  • Noncontact
  • Quenched Si(111)
  • SKPM

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

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title = "The effect of an electrostatic force on imaging a surface topography by noncontact atomic force microscope",
abstract = "Noncontact atomic force microscope (NC-AFM) with and without scanning Kelvin probe force microscope (SKPM) has been studied to clarify the effect of an electrostatic force between a cantilever tip and a specimen on the NC-AFM imaging. The NC-AFM image contrast of a quenched Si(111) surface reflected the distribution of the surface potential, while that observed with a feedback of the SKPM signal showed good agreements with the previous results. The experimental results show that the electrostatic force affects the NC-AFM image formation, so that the electrostatic effect must be compensated to obtain an actual surface topography by NC-AFM.",
keywords = "AFM, CPD, Electrostatic force, Noncontact, Quenched Si(111), SKPM",
author = "Tadashi Shiota and Keiji Nakayama",
year = "2001",
month = "9",
day = "15",
language = "English",
volume = "40",
journal = "Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes",
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TY - JOUR

T1 - The effect of an electrostatic force on imaging a surface topography by noncontact atomic force microscope

AU - Shiota, Tadashi

AU - Nakayama, Keiji

PY - 2001/9/15

Y1 - 2001/9/15

N2 - Noncontact atomic force microscope (NC-AFM) with and without scanning Kelvin probe force microscope (SKPM) has been studied to clarify the effect of an electrostatic force between a cantilever tip and a specimen on the NC-AFM imaging. The NC-AFM image contrast of a quenched Si(111) surface reflected the distribution of the surface potential, while that observed with a feedback of the SKPM signal showed good agreements with the previous results. The experimental results show that the electrostatic force affects the NC-AFM image formation, so that the electrostatic effect must be compensated to obtain an actual surface topography by NC-AFM.

AB - Noncontact atomic force microscope (NC-AFM) with and without scanning Kelvin probe force microscope (SKPM) has been studied to clarify the effect of an electrostatic force between a cantilever tip and a specimen on the NC-AFM imaging. The NC-AFM image contrast of a quenched Si(111) surface reflected the distribution of the surface potential, while that observed with a feedback of the SKPM signal showed good agreements with the previous results. The experimental results show that the electrostatic force affects the NC-AFM image formation, so that the electrostatic effect must be compensated to obtain an actual surface topography by NC-AFM.

KW - AFM

KW - CPD

KW - Electrostatic force

KW - Noncontact

KW - Quenched Si(111)

KW - SKPM

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M3 - Letter

AN - SCOPUS:0035885675

VL - 40

JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

SN - 0021-4922

IS - 9 A/B

ER -