Synthesis of high surface area Al-containing mesoporous silica from calcined and acid leached kaolinites as the precursors

Chengala D. Madhusoodana, Yoshikazu Kameshima, Akira Nakajima, Kiyoshi Okada, Toshihiro Kogure, Kenneth J.D. MacKenzie

Research output: Contribution to journalArticle

29 Citations (Scopus)

Abstract

Al-containing mesoporous silicas were synthesized by hydrothermal treatment of microporous silica prepared by selectively acid leached metakaolinites with Si/Al = 3.9-92.5 mixed with a surfactant of cetyltrimethylammonium bromide (CTABr). The specific surface area of the products increased with higher surfactant/microporous silica (surf/Si) ratio and Si/Al ratio of the microporous silica, reaching about 1400 m2/g at CTABr/Si {greater than or slanted equal to} 0.1 and Si/Al {greater than or slanted equal to} 40. The XRD patterns of these products show a hexagonal (100) peak with the lattice parameter a0 = 4.2 - 4.3 nm and the N2 adsorption isotherms show steep increase of adsorption between relative pressure of 0.3 and 0.4. Hexagonal mesoporous microstructure is observed by high resolution TEM. The pore size distributions of the products show a sharp peak at 2.8 nm by the BJH method. The high specific surface area of the present mesoporous samples is attributed to the lower matrix density and surface roughness of mesopore wall. The highest specific surface area of the products reached up to 1420 m2/g and this value is apparently higher than those reported in hexagonal mesoporous silicas. A unique microporous structure of the starting material is thought to be related to achieve such a high specific surface area of the products.

Original languageEnglish
Pages (from-to)724-731
Number of pages8
JournalJournal of Colloid And Interface Science
Volume297
Issue number2
DOIs
Publication statusPublished - May 15 2006
Externally publishedYes

Keywords

  • Al-containing mesoporous silica
  • Cetyltrimethylammonium bromide
  • Kaolinite
  • Microporous silica
  • Specific surface area

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Biomaterials
  • Surfaces, Coatings and Films
  • Colloid and Surface Chemistry

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