Synthesis of graphene by surface wave plasma chemical vapor deposition from camphor

Golap Kalita, Subash Sharma, Koichi Wakita, Masayoshi Umeno, Yasuhiko Hayashi, Masaki Tanemura

Research output: Contribution to journalArticle

9 Citations (Scopus)

Abstract

We demonstrate synthesis of graphene using the solid precursor camphor in a microwave excited surface wave plasma chemical vapor deposition technique. Highly sublimely camphor was introduced into the plasma chamber in the vapor phase along with Ar and uniform plasma formation was obtained. Rapid deposition of a graphene film on Cu foil was achieved at a relatively low temperature (<600°C). Raman spectroscopy and transmission electron microscopy clearly showed that the deposited film on Cu foil consist of few-layer graphene. Fully flexible transparent electrode was fabricated by transferring the graphene film with excellent properties for device application. Synthesis of large-area graphene film from solid botanical derivative camphor (C10H 16O) in a surface wave microwave plasma CVD technique.

Original languageEnglish
Pages (from-to)2510-2513
Number of pages4
JournalPhysica Status Solidi (A) Applications and Materials Science
Volume209
Issue number12
DOIs
Publication statusPublished - Dec 1 2012
Externally publishedYes

Keywords

  • camphor
  • graphene
  • surface wave plasma CVD
  • transparent electrode

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering
  • Materials Chemistry

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