Surface physical property of the CrO 2 thin films prepared using a closed chemical vapor deposition method

Y. Muraoka, S. Yoshida, T. Wakita, M. Hirai, T. Yokoya

Research output: Chapter in Book/Report/Conference proceedingConference contribution


We have examined the intrinsic surface physical property of a CrO 2 thin film by means of surface sensitive photoemission spectroscopy. Epitaxial thin film of CrO 2(100) has been grown on TiO 2(100) by a closed chemical vapor deposition method using a Cr 8O 21 precursor. Low-energy electron diffraction (LEED) observations find that epitaxial growth of rutile-phase CrO 2 occurs to the top monolayer of the film. Surface sensitive x-ray photoemission spectroscopy (XPS) measurements show a finite intensity in the region of the Fermi energy. The result evidences that the physical nature of near topmost layer of CrO 2 thin film is metallic. Progress of understanding of the surface physical property of CrO 2 thin film helps not only perform a reliable photoemission study to understand the physics of ferromagnetic metal in CrO 2, but also develop the CrO 2-based devices using a half-metallic nature for spintronics applications.

Original languageEnglish
Title of host publicationFunctional Metal Oxide Nanostructures
Number of pages6
Publication statusPublished - 2012
Event2011 MRS Fall Meeting - Boston, MA, United States
Duration: Nov 28 2011Dec 2 2011

Publication series

NameMaterials Research Society Symposium Proceedings
ISSN (Print)0272-9172


Other2011 MRS Fall Meeting
Country/TerritoryUnited States
CityBoston, MA

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering


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