Surface physical property of the CrO 2 thin films prepared using a closed chemical vapor deposition method

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Abstract

We have examined the intrinsic surface physical property of a CrO 2 thin film by means of surface sensitive photoemission spectroscopy. Epitaxial thin film of CrO 2(100) has been grown on TiO 2(100) by a closed chemical vapor deposition method using a Cr 8O 21 precursor. Low-energy electron diffraction (LEED) observations find that epitaxial growth of rutile-phase CrO 2 occurs to the top monolayer of the film. Surface sensitive x-ray photoemission spectroscopy (XPS) measurements show a finite intensity in the region of the Fermi energy. The result evidences that the physical nature of near topmost layer of CrO 2 thin film is metallic. Progress of understanding of the surface physical property of CrO 2 thin film helps not only perform a reliable photoemission study to understand the physics of ferromagnetic metal in CrO 2, but also develop the CrO 2-based devices using a half-metallic nature for spintronics applications.

Original languageEnglish
Title of host publicationMaterials Research Society Symposium Proceedings
Pages17-22
Number of pages6
Volume1406
DOIs
Publication statusPublished - 2012
Event2011 MRS Fall Meeting - Boston, MA, United States
Duration: Nov 28 2011Dec 2 2011

Other

Other2011 MRS Fall Meeting
CountryUnited States
CityBoston, MA
Period11/28/1112/2/11

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ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanical Engineering
  • Mechanics of Materials

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