Structural, optical and mechanical properties of nanostructure diamond synthesized by chemical vapor deposition

Yasuhiko Hayashi, Tetsuo Soga

Research output: Contribution to journalArticle

10 Citations (Scopus)

Abstract

Nanostructure diamond (NSD) films on Si substrate are prepared by microwave plasma enhanced chemical vapor deposition (MPECVD) using methane and hydrogen as the reactants with two-step negative substrate bias (SB). The dependencies of the NSD film morphology, grains, surface roughness, crystal and bonding structures and hardness on the negative SB at the bias-enhanced growth (BEG) step and substrate temperature during growth have been investigated by conducting atomic force microscopy (CAFM), X-ray diffraction (XRD), Raman spectroscopy and nanoindentation. The hardness of the NSD film is found to be as high as 80 GPa with CAFM average and root mean square roughness of 7 and 9 nm, respectively, under optimal negative SB at the BEG step. From the studies of substrate temperature effect, the hardness of the NSD film is as high as 70 GPa, with average and root mean square CAFM roughness of 9 and 11 nm, respectively, which were obtained at a substrate temperature of 500 °C. In both cases, the film hardness was found to be affected by the size of clusters, which are composed of many small NSD particles, the amount of NSD in an amorphous matrix as well as surface roughness. We also synthesized transparent NSD films by MPECVD under optimized single-step growth conditions on quartz substrates, which are scratched with several micrometers diamond powder. A hardness as high as 60 GPa and a maximum transmittance of 60% in the visible light region are achieved for an NSD coating of 1.0 μm thickness with small surface roughness.

Original languageEnglish
Pages (from-to)965-974
Number of pages10
JournalTribology International
Volume37
Issue number11-12 SPEC.ISS.
DOIs
Publication statusPublished - Nov 2004
Externally publishedYes

Fingerprint

Diamond
Structural properties
Chemical vapor deposition
Nanostructures
Diamonds
Optical properties
diamonds
vapor deposition
mechanical properties
Diamond films
optical properties
Mechanical properties
diamond films
Substrates
hardness
Surface roughness
Hardness
Atomic force microscopy
surface roughness
atomic force microscopy

Keywords

  • Diamond growth and characterization
  • Hard, flat and transparent diamond
  • MPECVD
  • Nanostructure diamond

ASJC Scopus subject areas

  • Colloid and Surface Chemistry
  • Engineering(all)
  • Mechanical Engineering
  • Surfaces, Coatings and Films

Cite this

Structural, optical and mechanical properties of nanostructure diamond synthesized by chemical vapor deposition. / Hayashi, Yasuhiko; Soga, Tetsuo.

In: Tribology International, Vol. 37, No. 11-12 SPEC.ISS., 11.2004, p. 965-974.

Research output: Contribution to journalArticle

@article{aba392dd14fa47949f7e3634262549fd,
title = "Structural, optical and mechanical properties of nanostructure diamond synthesized by chemical vapor deposition",
abstract = "Nanostructure diamond (NSD) films on Si substrate are prepared by microwave plasma enhanced chemical vapor deposition (MPECVD) using methane and hydrogen as the reactants with two-step negative substrate bias (SB). The dependencies of the NSD film morphology, grains, surface roughness, crystal and bonding structures and hardness on the negative SB at the bias-enhanced growth (BEG) step and substrate temperature during growth have been investigated by conducting atomic force microscopy (CAFM), X-ray diffraction (XRD), Raman spectroscopy and nanoindentation. The hardness of the NSD film is found to be as high as 80 GPa with CAFM average and root mean square roughness of 7 and 9 nm, respectively, under optimal negative SB at the BEG step. From the studies of substrate temperature effect, the hardness of the NSD film is as high as 70 GPa, with average and root mean square CAFM roughness of 9 and 11 nm, respectively, which were obtained at a substrate temperature of 500 °C. In both cases, the film hardness was found to be affected by the size of clusters, which are composed of many small NSD particles, the amount of NSD in an amorphous matrix as well as surface roughness. We also synthesized transparent NSD films by MPECVD under optimized single-step growth conditions on quartz substrates, which are scratched with several micrometers diamond powder. A hardness as high as 60 GPa and a maximum transmittance of 60{\%} in the visible light region are achieved for an NSD coating of 1.0 μm thickness with small surface roughness.",
keywords = "Diamond growth and characterization, Hard, flat and transparent diamond, MPECVD, Nanostructure diamond",
author = "Yasuhiko Hayashi and Tetsuo Soga",
year = "2004",
month = "11",
doi = "10.1016/j.triboint.2004.07.014",
language = "English",
volume = "37",
pages = "965--974",
journal = "Tribology International",
issn = "0301-679X",
publisher = "Elsevier Inc.",
number = "11-12 SPEC.ISS.",

}

TY - JOUR

T1 - Structural, optical and mechanical properties of nanostructure diamond synthesized by chemical vapor deposition

AU - Hayashi, Yasuhiko

AU - Soga, Tetsuo

PY - 2004/11

Y1 - 2004/11

N2 - Nanostructure diamond (NSD) films on Si substrate are prepared by microwave plasma enhanced chemical vapor deposition (MPECVD) using methane and hydrogen as the reactants with two-step negative substrate bias (SB). The dependencies of the NSD film morphology, grains, surface roughness, crystal and bonding structures and hardness on the negative SB at the bias-enhanced growth (BEG) step and substrate temperature during growth have been investigated by conducting atomic force microscopy (CAFM), X-ray diffraction (XRD), Raman spectroscopy and nanoindentation. The hardness of the NSD film is found to be as high as 80 GPa with CAFM average and root mean square roughness of 7 and 9 nm, respectively, under optimal negative SB at the BEG step. From the studies of substrate temperature effect, the hardness of the NSD film is as high as 70 GPa, with average and root mean square CAFM roughness of 9 and 11 nm, respectively, which were obtained at a substrate temperature of 500 °C. In both cases, the film hardness was found to be affected by the size of clusters, which are composed of many small NSD particles, the amount of NSD in an amorphous matrix as well as surface roughness. We also synthesized transparent NSD films by MPECVD under optimized single-step growth conditions on quartz substrates, which are scratched with several micrometers diamond powder. A hardness as high as 60 GPa and a maximum transmittance of 60% in the visible light region are achieved for an NSD coating of 1.0 μm thickness with small surface roughness.

AB - Nanostructure diamond (NSD) films on Si substrate are prepared by microwave plasma enhanced chemical vapor deposition (MPECVD) using methane and hydrogen as the reactants with two-step negative substrate bias (SB). The dependencies of the NSD film morphology, grains, surface roughness, crystal and bonding structures and hardness on the negative SB at the bias-enhanced growth (BEG) step and substrate temperature during growth have been investigated by conducting atomic force microscopy (CAFM), X-ray diffraction (XRD), Raman spectroscopy and nanoindentation. The hardness of the NSD film is found to be as high as 80 GPa with CAFM average and root mean square roughness of 7 and 9 nm, respectively, under optimal negative SB at the BEG step. From the studies of substrate temperature effect, the hardness of the NSD film is as high as 70 GPa, with average and root mean square CAFM roughness of 9 and 11 nm, respectively, which were obtained at a substrate temperature of 500 °C. In both cases, the film hardness was found to be affected by the size of clusters, which are composed of many small NSD particles, the amount of NSD in an amorphous matrix as well as surface roughness. We also synthesized transparent NSD films by MPECVD under optimized single-step growth conditions on quartz substrates, which are scratched with several micrometers diamond powder. A hardness as high as 60 GPa and a maximum transmittance of 60% in the visible light region are achieved for an NSD coating of 1.0 μm thickness with small surface roughness.

KW - Diamond growth and characterization

KW - Hard, flat and transparent diamond

KW - MPECVD

KW - Nanostructure diamond

UR - http://www.scopus.com/inward/record.url?scp=7544248436&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=7544248436&partnerID=8YFLogxK

U2 - 10.1016/j.triboint.2004.07.014

DO - 10.1016/j.triboint.2004.07.014

M3 - Article

VL - 37

SP - 965

EP - 974

JO - Tribology International

JF - Tribology International

SN - 0301-679X

IS - 11-12 SPEC.ISS.

ER -