Strain effects on spinodal decomposition in TiO2–VO2films on TiO2(100) substrates

Yuji Muraoka, Fumiya Yoshii, Takahiro Fukuda, Yuji Manabe, Mikiko Yasuno, Yoshito Takemoto, Kensei Terashima, Takanori Wakita, Takayoshi Yokoya

Research output: Contribution to journalArticlepeer-review

Abstract

We investigate the influence of lattice strain in the c-axis direction on spinodal decomposition in rutile TiO2–VO2 films on TiO2(100) substrates. The [100]-oriented Ti0.4V0.6O2(TVO) solid-solution films are fabricated on rutile TiO2(100) substrates using a pulsed laser deposition with a KrF excimer laser, and are annealed inside the spinodal region. X-ray diffraction and scanning transmission electron microscopy are employed for characterization. Consequently, the in-plane tensile strain in the c-axis direction promotes the Ti-V interdiffusion in TVO/TiO2(100) under thermal annealing. In contrast, relaxation of the tensile strain results in the occurrence of spinodal decomposition along the c-axis direction in the film. These results indicate that the relaxation of the tensile strain in the c-axis direction is critically important for enabling spinodal decomposition in TVO/TiO2(100). Our work helps deepen the understanding of spinodal decomposition in the TVO film and provides information on achieving novel nanostructures via spinodal decomposition in TVO/TiO2(100).

Original languageEnglish
Article number137854
JournalThin Solid Films
Volume698
DOIs
Publication statusPublished - Mar 31 2020

Keywords

  • Interdiffusion
  • Nanostructure
  • Pulsed laser deposition
  • Spinodal decomposition
  • Strain effect
  • Thin films
  • Titanium dioxide
  • Vanadium dioxide

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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