Spin-coatable Al2O3 resists in electron beam nanolithography

M. S M Saifullah, H. Namatsu, T. Yamaguchi, K. Yamazaki, K. Kurihara

Research output: Chapter in Book/Report/Conference proceedingChapter

9 Citations (Scopus)

Abstract

Inorganic resists such as amorphous alumina are projected as potential candidates for high resolution electron beam nanolithography, with drawbacks on low sensitivity and tedious deposition process such as sputtering. Therefore, a spin-coatable Al2O3 resist with higher sensitivity is strongly desirable to overcome these drawbacks. The electron beam exposure characteristics of spin-coatable Al2O3 gel films prepared by aluminum tri-secbutoxide, Al(OBus)3, with chelating agents like ethylacetoacetate (EAcAc) are investigated.

Original languageEnglish
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
PublisherSociety of Photo-Optical Instrumentation Engineers
Pages633-642
Number of pages10
Volume3678
EditionI
Publication statusPublished - 1999
Externally publishedYes
EventProceedings of the 1999 Microlithography - Advances in Resist Technology and Processing XVI - Santa Clara, CA, USA
Duration: Mar 15 1999Mar 17 1999

Other

OtherProceedings of the 1999 Microlithography - Advances in Resist Technology and Processing XVI
CitySanta Clara, CA, USA
Period3/15/993/17/99

Fingerprint

Nanolithography
Electron beams
electron beams
sensitivity
Chelation
Sputtering
Alumina
Gels
aluminum oxides
sputtering
gels
aluminum
Aluminum
high resolution

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Condensed Matter Physics

Cite this

Saifullah, M. S. M., Namatsu, H., Yamaguchi, T., Yamazaki, K., & Kurihara, K. (1999). Spin-coatable Al2O3 resists in electron beam nanolithography. In Proceedings of SPIE - The International Society for Optical Engineering (I ed., Vol. 3678, pp. 633-642). Society of Photo-Optical Instrumentation Engineers.

Spin-coatable Al2O3 resists in electron beam nanolithography. / Saifullah, M. S M; Namatsu, H.; Yamaguchi, T.; Yamazaki, K.; Kurihara, K.

Proceedings of SPIE - The International Society for Optical Engineering. Vol. 3678 I. ed. Society of Photo-Optical Instrumentation Engineers, 1999. p. 633-642.

Research output: Chapter in Book/Report/Conference proceedingChapter

Saifullah, MSM, Namatsu, H, Yamaguchi, T, Yamazaki, K & Kurihara, K 1999, Spin-coatable Al2O3 resists in electron beam nanolithography. in Proceedings of SPIE - The International Society for Optical Engineering. I edn, vol. 3678, Society of Photo-Optical Instrumentation Engineers, pp. 633-642, Proceedings of the 1999 Microlithography - Advances in Resist Technology and Processing XVI, Santa Clara, CA, USA, 3/15/99.
Saifullah MSM, Namatsu H, Yamaguchi T, Yamazaki K, Kurihara K. Spin-coatable Al2O3 resists in electron beam nanolithography. In Proceedings of SPIE - The International Society for Optical Engineering. I ed. Vol. 3678. Society of Photo-Optical Instrumentation Engineers. 1999. p. 633-642
Saifullah, M. S M ; Namatsu, H. ; Yamaguchi, T. ; Yamazaki, K. ; Kurihara, K. / Spin-coatable Al2O3 resists in electron beam nanolithography. Proceedings of SPIE - The International Society for Optical Engineering. Vol. 3678 I. ed. Society of Photo-Optical Instrumentation Engineers, 1999. pp. 633-642
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