Soft x-ray irradiation induced metallization of layered TiNCl

Noriyuki Kataoka, Masashi Tanaka, Wataru Hosoda, Takumi Taniguchi, Shin Ichi Fujimori, Takanori Wakita, Yuji Muraoka, Takayoshi Yokoya

Research output: Contribution to journalArticlepeer-review

Abstract

We have performed soft x-ray spectroscopy in order to study the photoirradiation time dependence of the valence band structure and chemical states of layered transition metal nitride chloride TiNCl. Under the soft x-ray irradiation, the intensities of the states near the Fermi level (E F) and the Ti3+ component increased, while the Cl 2p intensity decreased. Ti 2p-3d resonance photoemission spectroscopy confirmed a distinctive Fermi edge with Ti 3d character. These results indicate the photo-induced metallization originates from deintercalation due to Cl desorption, and thus provide a new carrier doping method that controls the conducting properties of TiNCl.

Original languageEnglish
Article number035501
JournalJournal of Physics Condensed Matter
Volume33
Issue number3
DOIs
Publication statusPublished - Oct 16 2020

Keywords

  • carrier doping method
  • layered nitride halides
  • photoemission spectroscopy

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics

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