Soft x-ray irradiation induced metallization of layered TiNCl

Noriyuki Kataoka, Masashi Tanaka, Wataru Hosoda, Takumi Taniguchi, Shin Ichi Fujimori, Takanori Wakita, Yuji Muraoka, Takayoshi Yokoya

    Research output: Contribution to journalArticlepeer-review

    Abstract

    We have performed soft x-ray spectroscopy in order to study the photoirradiation time dependence of the valence band structure and chemical states of layered transition metal nitride chloride TiNCl. Under the soft x-ray irradiation, the intensities of the states near the Fermi level (E F) and the Ti3+ component increased, while the Cl 2p intensity decreased. Ti 2p-3d resonance photoemission spectroscopy confirmed a distinctive Fermi edge with Ti 3d character. These results indicate the photo-induced metallization originates from deintercalation due to Cl desorption, and thus provide a new carrier doping method that controls the conducting properties of TiNCl.

    Original languageEnglish
    Article number035501
    JournalJournal of Physics Condensed Matter
    Volume33
    Issue number3
    DOIs
    Publication statusPublished - Oct 16 2020

    Keywords

    • carrier doping method
    • layered nitride halides
    • photoemission spectroscopy

    ASJC Scopus subject areas

    • Materials Science(all)
    • Condensed Matter Physics

    Fingerprint

    Dive into the research topics of 'Soft x-ray irradiation induced metallization of layered TiNCl'. Together they form a unique fingerprint.

    Cite this