Sintering of amorphous Si3N4 nanoclusters: a molecular dynamics study of stress analysis

Jinghan Wang, Kenji Tsuruta, Andrey Omeltchenko, Rajiv K. Kalia, Priya Vashishta

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

We investigate the onset and growth of the neck between amorphous Si3N4 nanoclusters at zero and finite pressures. Local stress fluctuations and atomic self-diffusion in the interface region are found to be responsible for neck formation. External pressure has a dramatic influence on the rate of sintering.

Original languageEnglish
Title of host publicationMaterials Research Society Symposium - Proceedings
EditorsEfthimios Kaxiras, John Joannopoulos, Priya Vashishta, Rajiv K. Kalia
PublisherMaterials Research Society
Pages573-578
Number of pages6
Volume408
Publication statusPublished - 1996
Externally publishedYes
EventProceedings of the 1996 MRS Fall Symposium - Boston, MA, USA
Duration: Nov 27 1995Dec 1 1995

Other

OtherProceedings of the 1996 MRS Fall Symposium
CityBoston, MA, USA
Period11/27/9512/1/95

Fingerprint

Nanoclusters
Stress analysis
Molecular dynamics
Sintering
silicon nitride

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials

Cite this

Wang, J., Tsuruta, K., Omeltchenko, A., Kalia, R. K., & Vashishta, P. (1996). Sintering of amorphous Si3N4 nanoclusters: a molecular dynamics study of stress analysis. In E. Kaxiras, J. Joannopoulos, P. Vashishta, & R. K. Kalia (Eds.), Materials Research Society Symposium - Proceedings (Vol. 408, pp. 573-578). Materials Research Society.

Sintering of amorphous Si3N4 nanoclusters : a molecular dynamics study of stress analysis. / Wang, Jinghan; Tsuruta, Kenji; Omeltchenko, Andrey; Kalia, Rajiv K.; Vashishta, Priya.

Materials Research Society Symposium - Proceedings. ed. / Efthimios Kaxiras; John Joannopoulos; Priya Vashishta; Rajiv K. Kalia. Vol. 408 Materials Research Society, 1996. p. 573-578.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Wang, J, Tsuruta, K, Omeltchenko, A, Kalia, RK & Vashishta, P 1996, Sintering of amorphous Si3N4 nanoclusters: a molecular dynamics study of stress analysis. in E Kaxiras, J Joannopoulos, P Vashishta & RK Kalia (eds), Materials Research Society Symposium - Proceedings. vol. 408, Materials Research Society, pp. 573-578, Proceedings of the 1996 MRS Fall Symposium, Boston, MA, USA, 11/27/95.
Wang J, Tsuruta K, Omeltchenko A, Kalia RK, Vashishta P. Sintering of amorphous Si3N4 nanoclusters: a molecular dynamics study of stress analysis. In Kaxiras E, Joannopoulos J, Vashishta P, Kalia RK, editors, Materials Research Society Symposium - Proceedings. Vol. 408. Materials Research Society. 1996. p. 573-578
Wang, Jinghan ; Tsuruta, Kenji ; Omeltchenko, Andrey ; Kalia, Rajiv K. ; Vashishta, Priya. / Sintering of amorphous Si3N4 nanoclusters : a molecular dynamics study of stress analysis. Materials Research Society Symposium - Proceedings. editor / Efthimios Kaxiras ; John Joannopoulos ; Priya Vashishta ; Rajiv K. Kalia. Vol. 408 Materials Research Society, 1996. pp. 573-578
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