SIMS with highly excited primary beams for molecular depth profiling and imaging of organic and biological materials

Jiro Matsuo, Satoshi Ninomiya, Hideaki Yamada, Kazuya Ichiki, Yoshinobu Wakamatsu, Masaki Hada, Toshio Seki, Takaaki Aoki

Research output: Contribution to journalArticle

24 Citations (Scopus)

Abstract

Recent developments in SIMS with both Ar cluster ions and swift heavy ions are presented. With these primary beams, the analysis of organic semiconductors and animal cells shows that one of the key factors to realizing the SIMS analysis of organic materials is high-energy deposition near the surface. Molecular depth profiling and images of organic materials were demonstrated by using SIMS.

Original languageEnglish
Pages (from-to)1612-1615
Number of pages4
JournalSurface and Interface Analysis
Volume42
Issue number10-11
DOIs
Publication statusPublished - Oct 2010
Externally publishedYes

Fingerprint

Depth profiling
Secondary ion mass spectrometry
organic materials
Biological materials
secondary ion mass spectrometry
Imaging techniques
Heavy Ions
Semiconducting organic compounds
organic semiconductors
Heavy ions
animals
heavy ions
Animals
Cells
Ions
cells
ions
energy

Keywords

  • Cluster ion beam
  • Molecular depth profiling
  • SIMS
  • Swift heavy ion beam

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Materials Chemistry
  • Surfaces, Coatings and Films

Cite this

Matsuo, J., Ninomiya, S., Yamada, H., Ichiki, K., Wakamatsu, Y., Hada, M., ... Aoki, T. (2010). SIMS with highly excited primary beams for molecular depth profiling and imaging of organic and biological materials. Surface and Interface Analysis, 42(10-11), 1612-1615. https://doi.org/10.1002/sia.3585

SIMS with highly excited primary beams for molecular depth profiling and imaging of organic and biological materials. / Matsuo, Jiro; Ninomiya, Satoshi; Yamada, Hideaki; Ichiki, Kazuya; Wakamatsu, Yoshinobu; Hada, Masaki; Seki, Toshio; Aoki, Takaaki.

In: Surface and Interface Analysis, Vol. 42, No. 10-11, 10.2010, p. 1612-1615.

Research output: Contribution to journalArticle

Matsuo, J, Ninomiya, S, Yamada, H, Ichiki, K, Wakamatsu, Y, Hada, M, Seki, T & Aoki, T 2010, 'SIMS with highly excited primary beams for molecular depth profiling and imaging of organic and biological materials', Surface and Interface Analysis, vol. 42, no. 10-11, pp. 1612-1615. https://doi.org/10.1002/sia.3585
Matsuo, Jiro ; Ninomiya, Satoshi ; Yamada, Hideaki ; Ichiki, Kazuya ; Wakamatsu, Yoshinobu ; Hada, Masaki ; Seki, Toshio ; Aoki, Takaaki. / SIMS with highly excited primary beams for molecular depth profiling and imaging of organic and biological materials. In: Surface and Interface Analysis. 2010 ; Vol. 42, No. 10-11. pp. 1612-1615.
@article{a72e0803e6e14cd2943b97f380ed72e9,
title = "SIMS with highly excited primary beams for molecular depth profiling and imaging of organic and biological materials",
abstract = "Recent developments in SIMS with both Ar cluster ions and swift heavy ions are presented. With these primary beams, the analysis of organic semiconductors and animal cells shows that one of the key factors to realizing the SIMS analysis of organic materials is high-energy deposition near the surface. Molecular depth profiling and images of organic materials were demonstrated by using SIMS.",
keywords = "Cluster ion beam, Molecular depth profiling, SIMS, Swift heavy ion beam",
author = "Jiro Matsuo and Satoshi Ninomiya and Hideaki Yamada and Kazuya Ichiki and Yoshinobu Wakamatsu and Masaki Hada and Toshio Seki and Takaaki Aoki",
year = "2010",
month = "10",
doi = "10.1002/sia.3585",
language = "English",
volume = "42",
pages = "1612--1615",
journal = "Surface and Interface Analysis",
issn = "0142-2421",
publisher = "John Wiley and Sons Ltd",
number = "10-11",

}

TY - JOUR

T1 - SIMS with highly excited primary beams for molecular depth profiling and imaging of organic and biological materials

AU - Matsuo, Jiro

AU - Ninomiya, Satoshi

AU - Yamada, Hideaki

AU - Ichiki, Kazuya

AU - Wakamatsu, Yoshinobu

AU - Hada, Masaki

AU - Seki, Toshio

AU - Aoki, Takaaki

PY - 2010/10

Y1 - 2010/10

N2 - Recent developments in SIMS with both Ar cluster ions and swift heavy ions are presented. With these primary beams, the analysis of organic semiconductors and animal cells shows that one of the key factors to realizing the SIMS analysis of organic materials is high-energy deposition near the surface. Molecular depth profiling and images of organic materials were demonstrated by using SIMS.

AB - Recent developments in SIMS with both Ar cluster ions and swift heavy ions are presented. With these primary beams, the analysis of organic semiconductors and animal cells shows that one of the key factors to realizing the SIMS analysis of organic materials is high-energy deposition near the surface. Molecular depth profiling and images of organic materials were demonstrated by using SIMS.

KW - Cluster ion beam

KW - Molecular depth profiling

KW - SIMS

KW - Swift heavy ion beam

UR - http://www.scopus.com/inward/record.url?scp=78449275839&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=78449275839&partnerID=8YFLogxK

U2 - 10.1002/sia.3585

DO - 10.1002/sia.3585

M3 - Article

AN - SCOPUS:78449275839

VL - 42

SP - 1612

EP - 1615

JO - Surface and Interface Analysis

JF - Surface and Interface Analysis

SN - 0142-2421

IS - 10-11

ER -