SIMS with highly excited primary beams for molecular depth profiling and imaging of organic and biological materials

Jiro Matsuo; Satoshi Ninomiya; Hideaki Yamada; Kazuya Ichiki; Yoshinobu Wakamatsu; Masaki Hada; Toshio Seki; Takaaki Aoki

doi:10.1002/sia.3585

SIMS with highly excited primary beams for molecular depth profiling and imaging of organic and biological materials

Jiro Matsuo, Satoshi Ninomiya, Hideaki Yamada, Kazuya Ichiki, Yoshinobu Wakamatsu, Masaki Hada, Toshio Seki, Takaaki Aoki

Graduate School of Natural Science and Technology

Research output: Contribution to journal › Article › peer-review

25 Citations (Scopus)

Abstract

Recent developments in SIMS with both Ar cluster ions and swift heavy ions are presented. With these primary beams, the analysis of organic semiconductors and animal cells shows that one of the key factors to realizing the SIMS analysis of organic materials is high-energy deposition near the surface. Molecular depth profiling and images of organic materials were demonstrated by using SIMS.

Original language	English
Pages (from-to)	1612-1615
Number of pages	4
Journal	Surface and Interface Analysis
Volume	42
Issue number	10-11
DOIs	https://doi.org/10.1002/sia.3585
Publication status	Published - Oct 2010

Keywords

Cluster ion beam
Molecular depth profiling
SIMS
Swift heavy ion beam

ASJC Scopus subject areas

Chemistry(all)
Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films
Materials Chemistry

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10.1002/sia.3585

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abstract = "Recent developments in SIMS with both Ar cluster ions and swift heavy ions are presented. With these primary beams, the analysis of organic semiconductors and animal cells shows that one of the key factors to realizing the SIMS analysis of organic materials is high-energy deposition near the surface. Molecular depth profiling and images of organic materials were demonstrated by using SIMS.",

keywords = "Cluster ion beam, Molecular depth profiling, SIMS, Swift heavy ion beam",

author = "Jiro Matsuo and Satoshi Ninomiya and Hideaki Yamada and Kazuya Ichiki and Yoshinobu Wakamatsu and Masaki Hada and Toshio Seki and Takaaki Aoki",

year = "2010",

month = oct,

doi = "10.1002/sia.3585",

language = "English",

volume = "42",

pages = "1612--1615",

journal = "Surface and Interface Analysis",

issn = "0142-2421",

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TY - JOUR

T1 - SIMS with highly excited primary beams for molecular depth profiling and imaging of organic and biological materials

AU - Matsuo, Jiro

AU - Ninomiya, Satoshi

AU - Yamada, Hideaki

AU - Ichiki, Kazuya

AU - Wakamatsu, Yoshinobu

AU - Hada, Masaki

AU - Seki, Toshio

AU - Aoki, Takaaki

PY - 2010/10

Y1 - 2010/10

N2 - Recent developments in SIMS with both Ar cluster ions and swift heavy ions are presented. With these primary beams, the analysis of organic semiconductors and animal cells shows that one of the key factors to realizing the SIMS analysis of organic materials is high-energy deposition near the surface. Molecular depth profiling and images of organic materials were demonstrated by using SIMS.

AB - Recent developments in SIMS with both Ar cluster ions and swift heavy ions are presented. With these primary beams, the analysis of organic semiconductors and animal cells shows that one of the key factors to realizing the SIMS analysis of organic materials is high-energy deposition near the surface. Molecular depth profiling and images of organic materials were demonstrated by using SIMS.

KW - Cluster ion beam

KW - Molecular depth profiling

KW - SIMS

KW - Swift heavy ion beam

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DO - 10.1002/sia.3585

M3 - Article

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JO - Surface and Interface Analysis

JF - Surface and Interface Analysis

SN - 0142-2421

IS - 10-11

ER -

SIMS with highly excited primary beams for molecular depth profiling and imaging of organic and biological materials

Abstract

Keywords

ASJC Scopus subject areas

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