Rewriting process of lower electrical resistance lines on TiO2 film using methods of whitening with electric furnace and darkening with femtosecond laser

Masahiro Tsukamoto, Togo Shinonaga, Nobuyuki Abe, Masanari Takahashi, Minoru Yoshida, Hitoshi Nakano, Masayuki Fujita

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

Rewriting process of lower electrical resistance lines on a titanium dioxide (TiO2) film was developed. In this process, lower electrical resistance lines were written on a TiO2 film without producing their surface topography changes by femtosecond laser irradiation. By heating with an electrical furnace under air, the electrical resistance of these lines was come back to the higher resistance with no topography changes. This result indicated that the lines could be erased by the heating method under air. When the erasing-treated area was irradiated with a femtosecond laser, the lower electrical resistance lines could be rewritten with no topography changes of the film surface.

Original languageEnglish
Pages (from-to)164-167
Number of pages4
JournalJournal of Laser Micro Nanoengineering
Volume6
Issue number2
DOIs
Publication statusPublished - Dec 7 2011
Externally publishedYes

Keywords

  • Darkening
  • Erasing
  • Femtosecond laser
  • Rewriting
  • Titanium dioxide
  • Whitening
  • Writing

ASJC Scopus subject areas

  • Instrumentation
  • Industrial and Manufacturing Engineering
  • Electrical and Electronic Engineering

Fingerprint Dive into the research topics of 'Rewriting process of lower electrical resistance lines on TiO<sub>2</sub> film using methods of whitening with electric furnace and darkening with femtosecond laser'. Together they form a unique fingerprint.

  • Cite this