Rewriting of low electrical resistance lines on TiO 2 film by writing and erasing with femtosecond and CW fiber lasers

Masahiro Tsukamoto, Ryosuke Nishii, Yu Muraki, Togo Shinonaga, Minoru Yoshida, Masanari Takahashi, Nobuyuki Abe

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)

Abstract

A rewriting process was developed for reduced electrical resistance lines on a titanium dioxide (TiO 2 ) film with femtosecond and CW fiber lasers. In this process, lines are written on TiO 2 film by femtosecond laser irradiation, where the lines have a lower electrical resistance than the surrounding film. By heating with a CW fiber laser in air, the low electrical resistance lines are erased and their electrical resistances increase. When the erased areas on the TiO 2 film are irradiated with the femtosecond laser, the lower electrical resistance lines can be rewritten on the film surface.

Original languageEnglish
Pages (from-to)730-735
Number of pages6
JournalApplied Surface Science
Volume313
DOIs
Publication statusPublished - Sep 15 2014

Keywords

  • Aerosol beam
  • CW fiber laser
  • Femtosecond laser
  • Lower electrical resistance line
  • Titanium dioxide

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Physics and Astronomy(all)
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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