Relationship of Nb Surface Morphology and Al Coverage to the Intrinsic Stress of Magnetron-Sputtered Nb Films

K. Tsukada; J. Kawai; G. Uehara; H. Kado

doi:10.1109/77.234018

Relationship of Nb Surface Morphology and Al Coverage to the Intrinsic Stress of Magnetron-Sputtered Nb Films

K. Tsukada, J. Kawai, G. Uehara, H. Kado

Research output: Contribution to journal › Letter › peer-review

17 Citations (Scopus)

Abstract

To optimize Nb/Al-AlOx/Nb Josephson junctions, atomic force microscopy is used to study the morphology of dc magnetron-sputtered Nb and Al. When the intrinsic stress of Nb films is varied by adjusting Ar pressure, the roughness of Nb films is correlated with the intrinsic stress. Stress-free Nb films have a smooth surface, without depressions, and a roughness of 14.6 A. The roughness of Al deposited on the Nb films reflects the roughness of the underlying Nb, and an Al thickness of more than 40 A is needed to cover the Nb surface without interruption.

Original language	English
Pages (from-to)	2944-2946
Number of pages	3
Journal	IEEE Transactions on Applied Superconductivity
Volume	3
Issue number	1
DOIs	https://doi.org/10.1109/77.234018
Publication status	Published - Mar 1993
Externally published	Yes

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Electrical and Electronic Engineering

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abstract = "To optimize Nb/Al-AlOx/Nb Josephson junctions, atomic force microscopy is used to study the morphology of dc magnetron-sputtered Nb and Al. When the intrinsic stress of Nb films is varied by adjusting Ar pressure, the roughness of Nb films is correlated with the intrinsic stress. Stress-free Nb films have a smooth surface, without depressions, and a roughness of 14.6 A. The roughness of Al deposited on the Nb films reflects the roughness of the underlying Nb, and an Al thickness of more than 40 A is needed to cover the Nb surface without interruption.",

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AU - Kado, H.

PY - 1993/3

Y1 - 1993/3

N2 - To optimize Nb/Al-AlOx/Nb Josephson junctions, atomic force microscopy is used to study the morphology of dc magnetron-sputtered Nb and Al. When the intrinsic stress of Nb films is varied by adjusting Ar pressure, the roughness of Nb films is correlated with the intrinsic stress. Stress-free Nb films have a smooth surface, without depressions, and a roughness of 14.6 A. The roughness of Al deposited on the Nb films reflects the roughness of the underlying Nb, and an Al thickness of more than 40 A is needed to cover the Nb surface without interruption.

AB - To optimize Nb/Al-AlOx/Nb Josephson junctions, atomic force microscopy is used to study the morphology of dc magnetron-sputtered Nb and Al. When the intrinsic stress of Nb films is varied by adjusting Ar pressure, the roughness of Nb films is correlated with the intrinsic stress. Stress-free Nb films have a smooth surface, without depressions, and a roughness of 14.6 A. The roughness of Al deposited on the Nb films reflects the roughness of the underlying Nb, and an Al thickness of more than 40 A is needed to cover the Nb surface without interruption.

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Relationship of Nb Surface Morphology and Al Coverage to the Intrinsic Stress of Magnetron-Sputtered Nb Films

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