Regulation of NaF release from bis-GMA/TEGDMA resin using γ-methacryloxypropyltrimethoxysilane

Satoshi Nakabo, Yasuhiro Torii, Toshiyuki Itota, Kunio Ishikawa, Kazuomi Suzuki

Research output: Contribution to journalArticle

14 Citations (Scopus)

Abstract

Objectives: The aim of this study was to evaluate the feasibility of regulation of NaF release from bis-GMA/TEGDMA resin using γ- methacryloxypropyltrimethoxysilane (γ-MPTS). Methods: NaF powder was treated with γ-MPTS to form a polysiloxane layer on its surface. The morphology and the composition of the NaF powder treated with γ-MPTS were evaluated using scanning electron microscopy, infrared spectroscopy, contact angle measurement and X-ray photoelectron spectroscopy. Bis-GMA/TEGDMA resin containing 50wt% NaF powder was prepared as a model resin and immersed in distilled water at 37°C, and the amount of fluoride released from the resin was measured using a fluoride electrode. The mechanical strength in terms of diametral tensile strength before and after fluoride release was also measured, and statistically analyzed using one-way factorial ANOVA and Fisher's PLSD method. Results: NaF powder was covered with hydrophobic γ-MPTS delivered polysiloxane. A larger amount of fluoride was released at the initial stage from the resin containing NaF treated with no γ-MPTS. However, fluoride release terminated in a relatively shorter period. In contrast, we observed a smaller amount of fluoride released for a longer period from the resin containing NaF treated with γ-MPTS. Significance: We found that γ-MPTS treatment is useful for the regulation of NaF release from bis-GMA/TEGDMA resin. The mechanism of slow NaF release may be the formation of a hydrophobic polysiloxane layer on the surface of NaF powder and resulting slow water diffusion to NaF powder.

Original languageEnglish
Pages (from-to)81-87
Number of pages7
JournalDental Materials
Volume18
Issue number1
DOIs
Publication statusPublished - Jan 2002

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Bisphenol A-Glycidyl Methacrylate
Fluorides
Powders
Resins
Siloxanes
Silicones
Photoelectron Spectroscopy
Water
Tensile Strength
Electron Scanning Microscopy
Angle measurement
Analysis of variance (ANOVA)
methacryloxypropyltrimethoxysilane
triethylene glycol dimethacrylate
Spectrum Analysis
Analysis of Variance
Electrodes
X ray powder diffraction
Contact angle
Strength of materials

Keywords

  • Fluoride release
  • Polysiloxane
  • Restorative resin
  • Sealant
  • Silane coupling agent

ASJC Scopus subject areas

  • Dentistry(all)

Cite this

Regulation of NaF release from bis-GMA/TEGDMA resin using γ-methacryloxypropyltrimethoxysilane. / Nakabo, Satoshi; Torii, Yasuhiro; Itota, Toshiyuki; Ishikawa, Kunio; Suzuki, Kazuomi.

In: Dental Materials, Vol. 18, No. 1, 01.2002, p. 81-87.

Research output: Contribution to journalArticle

Nakabo, Satoshi ; Torii, Yasuhiro ; Itota, Toshiyuki ; Ishikawa, Kunio ; Suzuki, Kazuomi. / Regulation of NaF release from bis-GMA/TEGDMA resin using γ-methacryloxypropyltrimethoxysilane. In: Dental Materials. 2002 ; Vol. 18, No. 1. pp. 81-87.
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abstract = "Objectives: The aim of this study was to evaluate the feasibility of regulation of NaF release from bis-GMA/TEGDMA resin using γ- methacryloxypropyltrimethoxysilane (γ-MPTS). Methods: NaF powder was treated with γ-MPTS to form a polysiloxane layer on its surface. The morphology and the composition of the NaF powder treated with γ-MPTS were evaluated using scanning electron microscopy, infrared spectroscopy, contact angle measurement and X-ray photoelectron spectroscopy. Bis-GMA/TEGDMA resin containing 50wt{\%} NaF powder was prepared as a model resin and immersed in distilled water at 37°C, and the amount of fluoride released from the resin was measured using a fluoride electrode. The mechanical strength in terms of diametral tensile strength before and after fluoride release was also measured, and statistically analyzed using one-way factorial ANOVA and Fisher's PLSD method. Results: NaF powder was covered with hydrophobic γ-MPTS delivered polysiloxane. A larger amount of fluoride was released at the initial stage from the resin containing NaF treated with no γ-MPTS. However, fluoride release terminated in a relatively shorter period. In contrast, we observed a smaller amount of fluoride released for a longer period from the resin containing NaF treated with γ-MPTS. Significance: We found that γ-MPTS treatment is useful for the regulation of NaF release from bis-GMA/TEGDMA resin. The mechanism of slow NaF release may be the formation of a hydrophobic polysiloxane layer on the surface of NaF powder and resulting slow water diffusion to NaF powder.",
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