Rapid epitaxial growth of Si and SiGe mono-crystalline films on silicon-on-glass substrates by reactive CVD using SiH4, GeH 4, and F2

Hiroshi Noge, Akira Okada, Ta Ko Chuang, J. Greg Couillard, Michio Kondo

Research output: Chapter in Book/Report/Conference proceedingConference contribution

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Chemical Compounds

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