Quantitative analysis of oxidative DNA damage induced by high-voltage pulsed discharge with cavitation

Ken ichi Kudo, Hironori Ito, Satoshi Ihara, Hiroaki Terato

Research output: Contribution to journalArticle

8 Citations (Scopus)

Abstract

Pulsed discharge is used for sterilization and disinfection, but the details of the molecular mechanisms remain largely unknown. Since pulsed discharge generates reactive oxygen species (ROS), we analyzed the oxidative DNA damages after pulsed discharge treatment to consider the involvement of ROS in the damaging process. We applied pulsed discharge with cavitation to plasmid DNA molecules and estimated the yields of the damages by agarose gel electrophoresis. The treated DNA contained various oxidative DNA damages, including single and double strand breaks and base lesions. The yields of the damages increased in response to the energy used for pulsed discharge. We also measured the yield of 8-hydroxyguanine (8-OH-G), one of the major oxidative base lesions, in the treated plasmid DNA by mass spectrometry quantitatively and found that the yield of the oxidative base lesion corresponded to the increment of the applied energy. In addition, we observed the involvement of mutM gene, which is responsible for repair of 8-OH-G, in the increased sensitivity of Escherichia coli to pulsed discharge. Therefore, ROS seem to mediate the sterilization ability of pulsed discharge.

Original languageEnglish
Pages (from-to)131-139
Number of pages9
JournalJournal of Electrostatics
Volume73
DOIs
Publication statusPublished - Feb 1 2015
Externally publishedYes

Keywords

  • 8-Hydroxyguanine
  • Cavitation
  • DNA damage
  • Pulsed discharge
  • Reactive oxygen species

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Biotechnology
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering

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