Progress in understanding of laser-produced plasmas for EUV source

N. Miyanaga, K. Fujima, S. Fujioka, Y. Fujimoto, H. Fujita, H. Furukawa, K. Hashimoto, T. Hibino, T. Kagawa, T. Kato, T. Kawamura, F. Koike, R. Matsui, R. More, M. Murakami, M. Nagai, M. Nakai, M. Nakatsuka, Takeshi Nishikawa, K. NishiharaH. Nishimura, T. Norimatsu, T. Okuno, A. Sasaki, K. Shigemori, Y. Shimada, F. L. Sohnatzadeh, A. Sunahara, H. Tanuma, Y. Tao, K. Tsubakimoto, S. Uchida, M. Yamaura, H. Yoshida, V. Zhakhovskii, Y. Izawa

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

An overview is given of a research study aimed at physical understanding of laser-produced plasma (LPP) as an EUV source for lithography. Focus is on recent experimental results of Sn and SnO2 targets and comparison with computer simulations.

Original languageEnglish
Title of host publicationConference Proceedings - Lasers and Electro-Optics Society Annual Meeting-LEOS
Pages297-298
Number of pages2
Volume1
Publication statusPublished - 2003
Event2003 IEEE LEOS Annual Meeting Conference Proceedings - TUCSON, AZ, United States
Duration: Oct 26 2003Oct 30 2003

Other

Other2003 IEEE LEOS Annual Meeting Conference Proceedings
CountryUnited States
CityTUCSON, AZ
Period10/26/0310/30/03

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Laser produced plasmas
Lithography
Computer simulation

ASJC Scopus subject areas

  • Industrial and Manufacturing Engineering
  • Control and Systems Engineering
  • Electrical and Electronic Engineering

Cite this

Miyanaga, N., Fujima, K., Fujioka, S., Fujimoto, Y., Fujita, H., Furukawa, H., ... Izawa, Y. (2003). Progress in understanding of laser-produced plasmas for EUV source. In Conference Proceedings - Lasers and Electro-Optics Society Annual Meeting-LEOS (Vol. 1, pp. 297-298)

Progress in understanding of laser-produced plasmas for EUV source. / Miyanaga, N.; Fujima, K.; Fujioka, S.; Fujimoto, Y.; Fujita, H.; Furukawa, H.; Hashimoto, K.; Hibino, T.; Kagawa, T.; Kato, T.; Kawamura, T.; Koike, F.; Matsui, R.; More, R.; Murakami, M.; Nagai, M.; Nakai, M.; Nakatsuka, M.; Nishikawa, Takeshi; Nishihara, K.; Nishimura, H.; Norimatsu, T.; Okuno, T.; Sasaki, A.; Shigemori, K.; Shimada, Y.; Sohnatzadeh, F. L.; Sunahara, A.; Tanuma, H.; Tao, Y.; Tsubakimoto, K.; Uchida, S.; Yamaura, M.; Yoshida, H.; Zhakhovskii, V.; Izawa, Y.

Conference Proceedings - Lasers and Electro-Optics Society Annual Meeting-LEOS. Vol. 1 2003. p. 297-298.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Miyanaga, N, Fujima, K, Fujioka, S, Fujimoto, Y, Fujita, H, Furukawa, H, Hashimoto, K, Hibino, T, Kagawa, T, Kato, T, Kawamura, T, Koike, F, Matsui, R, More, R, Murakami, M, Nagai, M, Nakai, M, Nakatsuka, M, Nishikawa, T, Nishihara, K, Nishimura, H, Norimatsu, T, Okuno, T, Sasaki, A, Shigemori, K, Shimada, Y, Sohnatzadeh, FL, Sunahara, A, Tanuma, H, Tao, Y, Tsubakimoto, K, Uchida, S, Yamaura, M, Yoshida, H, Zhakhovskii, V & Izawa, Y 2003, Progress in understanding of laser-produced plasmas for EUV source. in Conference Proceedings - Lasers and Electro-Optics Society Annual Meeting-LEOS. vol. 1, pp. 297-298, 2003 IEEE LEOS Annual Meeting Conference Proceedings, TUCSON, AZ, United States, 10/26/03.
Miyanaga N, Fujima K, Fujioka S, Fujimoto Y, Fujita H, Furukawa H et al. Progress in understanding of laser-produced plasmas for EUV source. In Conference Proceedings - Lasers and Electro-Optics Society Annual Meeting-LEOS. Vol. 1. 2003. p. 297-298
Miyanaga, N. ; Fujima, K. ; Fujioka, S. ; Fujimoto, Y. ; Fujita, H. ; Furukawa, H. ; Hashimoto, K. ; Hibino, T. ; Kagawa, T. ; Kato, T. ; Kawamura, T. ; Koike, F. ; Matsui, R. ; More, R. ; Murakami, M. ; Nagai, M. ; Nakai, M. ; Nakatsuka, M. ; Nishikawa, Takeshi ; Nishihara, K. ; Nishimura, H. ; Norimatsu, T. ; Okuno, T. ; Sasaki, A. ; Shigemori, K. ; Shimada, Y. ; Sohnatzadeh, F. L. ; Sunahara, A. ; Tanuma, H. ; Tao, Y. ; Tsubakimoto, K. ; Uchida, S. ; Yamaura, M. ; Yoshida, H. ; Zhakhovskii, V. ; Izawa, Y. / Progress in understanding of laser-produced plasmas for EUV source. Conference Proceedings - Lasers and Electro-Optics Society Annual Meeting-LEOS. Vol. 1 2003. pp. 297-298
@inproceedings{5921cce8fade4e46b16fdbd34a6c0858,
title = "Progress in understanding of laser-produced plasmas for EUV source",
abstract = "An overview is given of a research study aimed at physical understanding of laser-produced plasma (LPP) as an EUV source for lithography. Focus is on recent experimental results of Sn and SnO2 targets and comparison with computer simulations.",
author = "N. Miyanaga and K. Fujima and S. Fujioka and Y. Fujimoto and H. Fujita and H. Furukawa and K. Hashimoto and T. Hibino and T. Kagawa and T. Kato and T. Kawamura and F. Koike and R. Matsui and R. More and M. Murakami and M. Nagai and M. Nakai and M. Nakatsuka and Takeshi Nishikawa and K. Nishihara and H. Nishimura and T. Norimatsu and T. Okuno and A. Sasaki and K. Shigemori and Y. Shimada and Sohnatzadeh, {F. L.} and A. Sunahara and H. Tanuma and Y. Tao and K. Tsubakimoto and S. Uchida and M. Yamaura and H. Yoshida and V. Zhakhovskii and Y. Izawa",
year = "2003",
language = "English",
volume = "1",
pages = "297--298",
booktitle = "Conference Proceedings - Lasers and Electro-Optics Society Annual Meeting-LEOS",

}

TY - GEN

T1 - Progress in understanding of laser-produced plasmas for EUV source

AU - Miyanaga, N.

AU - Fujima, K.

AU - Fujioka, S.

AU - Fujimoto, Y.

AU - Fujita, H.

AU - Furukawa, H.

AU - Hashimoto, K.

AU - Hibino, T.

AU - Kagawa, T.

AU - Kato, T.

AU - Kawamura, T.

AU - Koike, F.

AU - Matsui, R.

AU - More, R.

AU - Murakami, M.

AU - Nagai, M.

AU - Nakai, M.

AU - Nakatsuka, M.

AU - Nishikawa, Takeshi

AU - Nishihara, K.

AU - Nishimura, H.

AU - Norimatsu, T.

AU - Okuno, T.

AU - Sasaki, A.

AU - Shigemori, K.

AU - Shimada, Y.

AU - Sohnatzadeh, F. L.

AU - Sunahara, A.

AU - Tanuma, H.

AU - Tao, Y.

AU - Tsubakimoto, K.

AU - Uchida, S.

AU - Yamaura, M.

AU - Yoshida, H.

AU - Zhakhovskii, V.

AU - Izawa, Y.

PY - 2003

Y1 - 2003

N2 - An overview is given of a research study aimed at physical understanding of laser-produced plasma (LPP) as an EUV source for lithography. Focus is on recent experimental results of Sn and SnO2 targets and comparison with computer simulations.

AB - An overview is given of a research study aimed at physical understanding of laser-produced plasma (LPP) as an EUV source for lithography. Focus is on recent experimental results of Sn and SnO2 targets and comparison with computer simulations.

UR - http://www.scopus.com/inward/record.url?scp=0344897072&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0344897072&partnerID=8YFLogxK

M3 - Conference contribution

AN - SCOPUS:0344897072

VL - 1

SP - 297

EP - 298

BT - Conference Proceedings - Lasers and Electro-Optics Society Annual Meeting-LEOS

ER -