Preparation of TiO2 thin films by electrophoresis deposition method for dye-sensitized solar cells

Kunio Yamamoto, Kenji Sakai, Shinzo Yoshikado

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

The purpose of this study is to prepare high-quality TiO2 thin films for dye-sensitized solar cells using the electrophoresis method. A high-quality TiO2 thin film has a thickness of approximately 10 um and no crack on the surface. In this study, TiO2 thin films were deposited by changing the configuration of electrophoresis electrodes. When electrodes were set parallel to horizontal and ITO glass substrate was set in the upper electrode, an excellent TiO2 thin film of approximately 10 μm thickness was obtained by depositing very thin TiO2 films as a buffer layer. The new film has the highest open-circuit voltage and short-circuit current density.

Original languageEnglish
Pages (from-to)151-154
Number of pages4
JournalKey Engineering Materials
Volume350
DOIs
Publication statusPublished - 2007
Externally publishedYes

Fingerprint

Electrophoresis
Thin films
Electrodes
ITO glass
Open circuit voltage
Buffer layers
Short circuit currents
Current density
Dye-sensitized solar cells
Cracks
Substrates

Keywords

  • Dye-sensitized solar cells
  • Electrophoresis method
  • TiO, EosinY

ASJC Scopus subject areas

  • Ceramics and Composites
  • Chemical Engineering (miscellaneous)

Cite this

Preparation of TiO2 thin films by electrophoresis deposition method for dye-sensitized solar cells. / Yamamoto, Kunio; Sakai, Kenji; Yoshikado, Shinzo.

In: Key Engineering Materials, Vol. 350, 2007, p. 151-154.

Research output: Contribution to journalArticle

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