Preparation of the CrO2 thin films using a Cr8O 21 precursor

Y. Muraoka, K. Iwai, S. Yoshida, T. Wakita, M. Hirai, T. Yokoya, Y. Kato, T. Muro, Y. Tamenori

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

We have prepared a CrO2 thin film by chemical vapor deposition from a Cr8O21 precursor and studied the bulk and surface physical properties. The CrO2 thin film is grown on TiO 2(100) substrate by heating precursor and TiO2 (100) substrate together in a sealed quartz tube. The prepared film is found from x-ray diffraction analysis to be an (100)-oriented single phase. The magnetization and resistivity measurements indicate that the film is a ferromagnetic metal with a Curie temperature of about 400 K. Cr 3s core-level and valence band photoelectron spectroscopy spectra reveal the presence of a metallic CrO2 in the surface region of the film. Our work indicates that preparation from a Cr8O21 precursor in a closed system is promising for obtaining a CrO2 thin film with the metallic surface.

Original languageEnglish
Title of host publicationOxide Nanoelectronics
Pages87-92
Number of pages6
DOIs
Publication statusPublished - Sep 30 2011
Event2010 MRS Fall Meeting - Boston, MA, United States
Duration: Nov 29 2010Dec 3 2010

Publication series

NameMaterials Research Society Symposium Proceedings
Volume1292
ISSN (Print)0272-9172

Other

Other2010 MRS Fall Meeting
CountryUnited States
CityBoston, MA
Period11/29/1012/3/10

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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