Preparation of the CrO2 thin films using a Cr8O 21 precursor

Yuji Muraoka, K. Iwai, S. Yoshida, Takanori Wakita, M. Hirai, Takayoshi Yokoya, Y. Kato, T. Muro, Y. Tamenori

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

We have prepared a CrO2 thin film by chemical vapor deposition from a Cr8O21 precursor and studied the bulk and surface physical properties. The CrO2 thin film is grown on TiO 2(100) substrate by heating precursor and TiO2 (100) substrate together in a sealed quartz tube. The prepared film is found from x-ray diffraction analysis to be an (100)-oriented single phase. The magnetization and resistivity measurements indicate that the film is a ferromagnetic metal with a Curie temperature of about 400 K. Cr 3s core-level and valence band photoelectron spectroscopy spectra reveal the presence of a metallic CrO2 in the surface region of the film. Our work indicates that preparation from a Cr8O21 precursor in a closed system is promising for obtaining a CrO2 thin film with the metallic surface.

Original languageEnglish
Title of host publicationMaterials Research Society Symposium Proceedings
Pages87-92
Number of pages6
Volume1292
DOIs
Publication statusPublished - 2011
Event2010 MRS Fall Meeting - Boston, MA, United States
Duration: Nov 29 2010Dec 3 2010

Other

Other2010 MRS Fall Meeting
CountryUnited States
CityBoston, MA
Period11/29/1012/3/10

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ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanical Engineering
  • Mechanics of Materials

Cite this

Muraoka, Y., Iwai, K., Yoshida, S., Wakita, T., Hirai, M., Yokoya, T., Kato, Y., Muro, T., & Tamenori, Y. (2011). Preparation of the CrO2 thin films using a Cr8O 21 precursor. In Materials Research Society Symposium Proceedings (Vol. 1292, pp. 87-92) https://doi.org/10.1557/opl.2011.154