Preparation of epitaxial LiNbO3 thin film by MOCVD and its properties

R. Morohashi, N. Wakiya, T. Kiguchi, T. Yoshioka, J. Tanaka, K. Shinozaki

Research output: Contribution to journalArticle

5 Citations (Scopus)

Abstract

Lithium niobate (LiNbO3) thin films were deposited on Al 2O3(001) substrates using metal-organic chemical vapor deposition (MOCVD), with Li(dpm) and Nb(C2H5)5 as precursors. By optimizing the conditions of thin film deposition, the c-axis oriented and epitaxially grown LiNbO3 thin films with stoichiometric composition were deposited on an Al2O3(001) substrate. The refractive index of the stoichiometric LiNbO3 thin film was 2.24 at λ = 632.8 nm, which is close to that of bulk crystal.

Original languageEnglish
Pages (from-to)179-182
Number of pages4
JournalKey Engineering Materials
Volume388
Publication statusPublished - Jan 1 2009
Externally publishedYes

Keywords

  • Epitaxial film
  • LiNbO
  • MOCVD
  • Optical property
  • Refractive index
  • Thin film

ASJC Scopus subject areas

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering

Fingerprint Dive into the research topics of 'Preparation of epitaxial LiNbO<sub>3</sub> thin film by MOCVD and its properties'. Together they form a unique fingerprint.

  • Cite this

    Morohashi, R., Wakiya, N., Kiguchi, T., Yoshioka, T., Tanaka, J., & Shinozaki, K. (2009). Preparation of epitaxial LiNbO3 thin film by MOCVD and its properties. Key Engineering Materials, 388, 179-182.