Preparation of epitaxial LiNbO3 thin film by MOCVD and its properties

R. Morohashi, N. Wakiya, T. Kiguchi, Tomohiko Yoshioka, J. Tanaka, K. Shinozaki

Research output: Contribution to journalArticle

5 Citations (Scopus)

Abstract

Lithium niobate (LiNbO3) thin films were deposited on Al 2O3(001) substrates using metal-organic chemical vapor deposition (MOCVD), with Li(dpm) and Nb(C2H5)5 as precursors. By optimizing the conditions of thin film deposition, the c-axis oriented and epitaxially grown LiNbO3 thin films with stoichiometric composition were deposited on an Al2O3(001) substrate. The refractive index of the stoichiometric LiNbO3 thin film was 2.24 at λ = 632.8 nm, which is close to that of bulk crystal.

Original languageEnglish
Pages (from-to)179-182
Number of pages4
JournalKey Engineering Materials
Volume388
DOIs
Publication statusPublished - 2009
Externally publishedYes

Fingerprint

Organic Chemicals
Epitaxial films
Organic chemicals
Chemical vapor deposition
Metals
Thin films
Substrates
Refractive index
Lithium
Crystals
lithium niobate
Chemical analysis

Keywords

  • Epitaxial film
  • LiNbO
  • MOCVD
  • Optical property
  • Refractive index
  • Thin film

ASJC Scopus subject areas

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering

Cite this

Preparation of epitaxial LiNbO3 thin film by MOCVD and its properties. / Morohashi, R.; Wakiya, N.; Kiguchi, T.; Yoshioka, Tomohiko; Tanaka, J.; Shinozaki, K.

In: Key Engineering Materials, Vol. 388, 2009, p. 179-182.

Research output: Contribution to journalArticle

Morohashi, R. ; Wakiya, N. ; Kiguchi, T. ; Yoshioka, Tomohiko ; Tanaka, J. ; Shinozaki, K. / Preparation of epitaxial LiNbO3 thin film by MOCVD and its properties. In: Key Engineering Materials. 2009 ; Vol. 388. pp. 179-182.
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AU - Shinozaki, K.

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