Preparation and characterization of epitaxial FeTiO3+λ films

Tatsuo Fujii, Masakazu Kayano, Yusuke Takada, Makoto Nakanishi, Jim Takada

Research output: Contribution to journalArticle

24 Citations (Scopus)

Abstract

Epitaxial FeTiO3+λ(001) films were prepared on α-Al2O3(001) substrates by helicon plasma sputtering technique. Structure and magnetic properties of FeTiO 3+λ film were largely dependent on the residual oxygen pressure (Po2) during the sputtering deposition. The films prepared at lower Po2 had an ilmenite (R3̄) structure, while a corundum (R3̄c) structure was observed in the case of higher Po2. The oxidation state of Fe in FeTiO3+λ films changed monotonically from Fe2+ to Fe3+ with increasing the Po2. The films with the R3̄ symmetry were ferrimagnitic at low temperature, while the nonstoichiometric FeTiO3+λ with the R3̄c symmetry were antiferromagnetic at room temperature.

Original languageEnglish
Pages (from-to)2010-2011
Number of pages2
JournalJournal of Magnetism and Magnetic Materials
Volume272-276
Issue numberIII
DOIs
Publication statusPublished - May 2004

Fingerprint

Epitaxial films
preparation
Sputtering
sputtering
Helicons
Ilmenite
Corundum
ilmenite
Aluminum Oxide
symmetry
Magnetic properties
aluminum oxides
Oxygen
magnetic properties
Plasmas
Oxidation
Temperature
oxidation
room temperature
oxygen

Keywords

  • Epitaxial films
  • Ferrimagnetism
  • Ilmenite
  • Ordered structure
  • Oxygen nonstoichiometry

ASJC Scopus subject areas

  • Condensed Matter Physics

Cite this

Preparation and characterization of epitaxial FeTiO3+λ films. / Fujii, Tatsuo; Kayano, Masakazu; Takada, Yusuke; Nakanishi, Makoto; Takada, Jim.

In: Journal of Magnetism and Magnetic Materials, Vol. 272-276, No. III, 05.2004, p. 2010-2011.

Research output: Contribution to journalArticle

Fujii, Tatsuo ; Kayano, Masakazu ; Takada, Yusuke ; Nakanishi, Makoto ; Takada, Jim. / Preparation and characterization of epitaxial FeTiO3+λ films. In: Journal of Magnetism and Magnetic Materials. 2004 ; Vol. 272-276, No. III. pp. 2010-2011.
@article{98d78a1ca0ec47e3b430985e6bae427a,
title = "Preparation and characterization of epitaxial FeTiO3+λ films",
abstract = "Epitaxial FeTiO3+λ(001) films were prepared on α-Al2O3(001) substrates by helicon plasma sputtering technique. Structure and magnetic properties of FeTiO 3+λ film were largely dependent on the residual oxygen pressure (Po2) during the sputtering deposition. The films prepared at lower Po2 had an ilmenite (R3̄) structure, while a corundum (R3̄c) structure was observed in the case of higher Po2. The oxidation state of Fe in FeTiO3+λ films changed monotonically from Fe2+ to Fe3+ with increasing the Po2. The films with the R3̄ symmetry were ferrimagnitic at low temperature, while the nonstoichiometric FeTiO3+λ with the R3̄c symmetry were antiferromagnetic at room temperature.",
keywords = "Epitaxial films, Ferrimagnetism, Ilmenite, Ordered structure, Oxygen nonstoichiometry",
author = "Tatsuo Fujii and Masakazu Kayano and Yusuke Takada and Makoto Nakanishi and Jim Takada",
year = "2004",
month = "5",
doi = "10.1016/j.jmmm.2003.12.793",
language = "English",
volume = "272-276",
pages = "2010--2011",
journal = "Journal of Magnetism and Magnetic Materials",
issn = "0304-8853",
publisher = "Elsevier",
number = "III",

}

TY - JOUR

T1 - Preparation and characterization of epitaxial FeTiO3+λ films

AU - Fujii, Tatsuo

AU - Kayano, Masakazu

AU - Takada, Yusuke

AU - Nakanishi, Makoto

AU - Takada, Jim

PY - 2004/5

Y1 - 2004/5

N2 - Epitaxial FeTiO3+λ(001) films were prepared on α-Al2O3(001) substrates by helicon plasma sputtering technique. Structure and magnetic properties of FeTiO 3+λ film were largely dependent on the residual oxygen pressure (Po2) during the sputtering deposition. The films prepared at lower Po2 had an ilmenite (R3̄) structure, while a corundum (R3̄c) structure was observed in the case of higher Po2. The oxidation state of Fe in FeTiO3+λ films changed monotonically from Fe2+ to Fe3+ with increasing the Po2. The films with the R3̄ symmetry were ferrimagnitic at low temperature, while the nonstoichiometric FeTiO3+λ with the R3̄c symmetry were antiferromagnetic at room temperature.

AB - Epitaxial FeTiO3+λ(001) films were prepared on α-Al2O3(001) substrates by helicon plasma sputtering technique. Structure and magnetic properties of FeTiO 3+λ film were largely dependent on the residual oxygen pressure (Po2) during the sputtering deposition. The films prepared at lower Po2 had an ilmenite (R3̄) structure, while a corundum (R3̄c) structure was observed in the case of higher Po2. The oxidation state of Fe in FeTiO3+λ films changed monotonically from Fe2+ to Fe3+ with increasing the Po2. The films with the R3̄ symmetry were ferrimagnitic at low temperature, while the nonstoichiometric FeTiO3+λ with the R3̄c symmetry were antiferromagnetic at room temperature.

KW - Epitaxial films

KW - Ferrimagnetism

KW - Ilmenite

KW - Ordered structure

KW - Oxygen nonstoichiometry

UR - http://www.scopus.com/inward/record.url?scp=7644230258&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=7644230258&partnerID=8YFLogxK

U2 - 10.1016/j.jmmm.2003.12.793

DO - 10.1016/j.jmmm.2003.12.793

M3 - Article

AN - SCOPUS:7644230258

VL - 272-276

SP - 2010

EP - 2011

JO - Journal of Magnetism and Magnetic Materials

JF - Journal of Magnetism and Magnetic Materials

SN - 0304-8853

IS - III

ER -