Plasma profiles of inductively coupled plasmas sustained with low-inductance internal antenna

Kosuke Takenaka, Takashi Sera, Akinori Ebe, Yuichi Setsuhara

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

We have investigated plasma profiles of inductively coupled plasmas (ICPs) sustained with a single low-inductance antenna (LIA) in terms of plasma density, electron temperature, and potential formation to understand effects of plasma properties in generation region (near antenna) and those in downstream region. The densities of plasmas sustained with a single antenna were as high as 1012 cm-3 near the antenna and had almost uniform profiles in the downstream region away from the single antenna about 100 mm. The floating potential as low as 5-6 V was achieved by effective suppression of electrostatic coupling due to lowering antenna RF voltage. The plasma density profile was independent of RF power.

Original languageEnglish
JournalPlasma Processes and Polymers
Volume4
Issue numberSUPPL.1
DOIs
Publication statusPublished - 2007
Externally publishedYes

Fingerprint

Inductively coupled plasma
inductance
Inductance
antennas
Antennas
Plasmas
profiles
Plasma density
plasma density
Electron temperature
floating
Electrostatics
retarding
electron energy
electrostatics
Electric potential
electric potential

Keywords

  • Antenna discharges
  • Internal antenna
  • Large-area
  • Plasma source
  • Plasma treatment

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Polymers and Plastics

Cite this

Plasma profiles of inductively coupled plasmas sustained with low-inductance internal antenna. / Takenaka, Kosuke; Sera, Takashi; Ebe, Akinori; Setsuhara, Yuichi.

In: Plasma Processes and Polymers, Vol. 4, No. SUPPL.1, 2007.

Research output: Contribution to journalArticle

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AB - We have investigated plasma profiles of inductively coupled plasmas (ICPs) sustained with a single low-inductance antenna (LIA) in terms of plasma density, electron temperature, and potential formation to understand effects of plasma properties in generation region (near antenna) and those in downstream region. The densities of plasmas sustained with a single antenna were as high as 1012 cm-3 near the antenna and had almost uniform profiles in the downstream region away from the single antenna about 100 mm. The floating potential as low as 5-6 V was achieved by effective suppression of electrostatic coupling due to lowering antenna RF voltage. The plasma density profile was independent of RF power.

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