Plasma nitriding of Fe-18Cr-9Ni in the range of 723-823 K

H. Kuwahara; H. Matsuoka; J. Takada; S. Kikuchi; Y. Tomii; I. Tamura

doi:10.1007/BF00938459

Plasma nitriding of Fe-18Cr-9Ni in the range of 723-823 K

H. Kuwahara, H. Matsuoka, J. Takada, S. Kikuchi, Y. Tomii, I. Tamura

Faculty of Engineering

Research output: Contribution to journal › Article

25 Citations (Scopus)

Abstract

To clarify the mechanism of plasma nitriding, we examined the optical microstructure, the hardness, the precipitation, and the concentration of dissolved nitrogen in Fe-18Cr-9Ni nitrided using plasma in the range of 723-823 K. Compared with ammonia-gas nitriding, the features of plasma nitriding are the formation of small chromium-nitride precipitates (CrN), the absence of an externally nitrided layer, the high concentration of dissolved nitrogen, and the high hardness (HV=1200). The diffusion coefficient of nitrogen in the present alloy was determined using the growth rate of the internally nitrided layer, based on calculations used in internal oxidation. Plasma- and gas-nitriding were also compared with respect to the growth rate of the nitrided layer.

Original language	English
Pages (from-to)	143-156
Number of pages	14
Journal	Oxidation of Metals
Volume	36
Issue number	1-2
DOIs	https://doi.org/10.1007/BF00938459
Publication status	Published - Aug 1 1991

Keywords

CrN precipitates
Fe-18Cr-9Ni
kinetics
nitrogen diffusion
plasma nitriding

ASJC Scopus subject areas

Inorganic Chemistry
Metals and Alloys
Materials Chemistry

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Kuwahara, H., Matsuoka, H., Takada, J., Kikuchi, S., Tomii, Y., & Tamura, I. (1991). Plasma nitriding of Fe-18Cr-9Ni in the range of 723-823 K. Oxidation of Metals, 36(1-2), 143-156. https://doi.org/10.1007/BF00938459

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abstract = "To clarify the mechanism of plasma nitriding, we examined the optical microstructure, the hardness, the precipitation, and the concentration of dissolved nitrogen in Fe-18Cr-9Ni nitrided using plasma in the range of 723-823 K. Compared with ammonia-gas nitriding, the features of plasma nitriding are the formation of small chromium-nitride precipitates (CrN), the absence of an externally nitrided layer, the high concentration of dissolved nitrogen, and the high hardness (HV=1200). The diffusion coefficient of nitrogen in the present alloy was determined using the growth rate of the internally nitrided layer, based on calculations used in internal oxidation. Plasma- and gas-nitriding were also compared with respect to the growth rate of the nitrided layer.",

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author = "H. Kuwahara and H. Matsuoka and J. Takada and S. Kikuchi and Y. Tomii and I. Tamura",

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AU - Kuwahara, H.

AU - Matsuoka, H.

AU - Takada, J.

AU - Kikuchi, S.

AU - Tomii, Y.

AU - Tamura, I.

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N2 - To clarify the mechanism of plasma nitriding, we examined the optical microstructure, the hardness, the precipitation, and the concentration of dissolved nitrogen in Fe-18Cr-9Ni nitrided using plasma in the range of 723-823 K. Compared with ammonia-gas nitriding, the features of plasma nitriding are the formation of small chromium-nitride precipitates (CrN), the absence of an externally nitrided layer, the high concentration of dissolved nitrogen, and the high hardness (HV=1200). The diffusion coefficient of nitrogen in the present alloy was determined using the growth rate of the internally nitrided layer, based on calculations used in internal oxidation. Plasma- and gas-nitriding were also compared with respect to the growth rate of the nitrided layer.

AB - To clarify the mechanism of plasma nitriding, we examined the optical microstructure, the hardness, the precipitation, and the concentration of dissolved nitrogen in Fe-18Cr-9Ni nitrided using plasma in the range of 723-823 K. Compared with ammonia-gas nitriding, the features of plasma nitriding are the formation of small chromium-nitride precipitates (CrN), the absence of an externally nitrided layer, the high concentration of dissolved nitrogen, and the high hardness (HV=1200). The diffusion coefficient of nitrogen in the present alloy was determined using the growth rate of the internally nitrided layer, based on calculations used in internal oxidation. Plasma- and gas-nitriding were also compared with respect to the growth rate of the nitrided layer.

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