Abstract
α-silicon carbide ceramics with different nitrogen content were fabricated by changing the post-HIP nitrogen gas pressure. Resultant silicon carbide ceramics were all n-type semiconductors in which doped nitrogen played a role of donor. With the doping pressure up to 150 MPa, incorporated nitrogen were dissolved into silicon carbide. Lattice parameter, carrier concentration and piezoresistance coefficient changed in accordance with the solution content. Over 150 MPa, nitrogen incorporation continued to increase while nitrogen solution was saturated.
Original language | English |
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Pages (from-to) | 346-349 |
Number of pages | 4 |
Journal | Funtai Oyobi Fummatsu Yakin/Journal of the Japan Society of Powder and Powder Metallurgy |
Volume | 51 |
Issue number | 5 |
DOIs | |
Publication status | Published - May 2004 |
Keywords
- Donor
- HIP
- Nitrogen doping
- Piezoresistance
- Silicon carbide
ASJC Scopus subject areas
- Mechanical Engineering
- Industrial and Manufacturing Engineering
- Metals and Alloys
- Materials Chemistry