Photovoltaic cells based on boron-doped amorphous carbon on N-SI prepared by RF plasma-enhanced chemical vapor deposition using trimethylboron

Yasuhiko Hayashi, Tetsuo Soga, Takashi Jimbo

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Photovoltaic cells based on boron-doped p-type amorphous carbon on n-Si have been synthesized by rf plasma-enhanced CVD using trimethylboron (TMB). In order to identify the optimal doping condition, various TMB/CH4 flow ratios have been investigated. A p-type a-C:H/n-Si heterojunction solar cells with a conversion efficiency as high as 0.007 % have been fabricated. The spectral response of cell photocurrents in the short wavelength region below 700 nm is determined to be due to the optical absorption of the boron-doped a-C:H film based on the optical gap measured by UV-visible spectroscopy. The photovoltaic properties of the a-C:H based solar cell structures are discussed with the dark and illuminated current density-voltage characteristics (efficiency, short-circuit current, open-circuit voltage, fill factor and series resistance) as well as optical properties of boron-doped a-C:H film characterized by UV-visible spectroscopy.

Original languageEnglish
Title of host publicationProceddings of the 3rd World Conference on Photovoltaic Energy Conversion
EditorsK. Kurokawa, L.L. Kazmerski, B. McNeils, M. Yamaguchi, C. Wronski
Pages151-154
Number of pages4
Publication statusPublished - Dec 1 2003
Externally publishedYes
EventProceddings of the 3rd World Conference on Photovoltaic Energy Conversion - Osaka, Japan
Duration: May 11 2003May 18 2003

Publication series

NameProceedings of the 3rd World Conference on Photovoltaic Energy Conversion
VolumeA

Other

OtherProceddings of the 3rd World Conference on Photovoltaic Energy Conversion
CountryJapan
CityOsaka
Period5/11/035/18/03

ASJC Scopus subject areas

  • Engineering(all)

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  • Cite this

    Hayashi, Y., Soga, T., & Jimbo, T. (2003). Photovoltaic cells based on boron-doped amorphous carbon on N-SI prepared by RF plasma-enhanced chemical vapor deposition using trimethylboron. In K. Kurokawa, L. L. Kazmerski, B. McNeils, M. Yamaguchi, & C. Wronski (Eds.), Proceddings of the 3rd World Conference on Photovoltaic Energy Conversion (pp. 151-154). (Proceedings of the 3rd World Conference on Photovoltaic Energy Conversion; Vol. A).