Photoinduced surface roughness variation in polycrystalline TiO2 thin films

Ken ichi Katsumata; Akira Nakajima; Tadashi Shiota; Naoya Yoshida; Toshiya Watanabe; Yoshikazu Kameshima; Kiyoshi Okada

doi:10.1016/j.jphotochem.2005.09.023

Photoinduced surface roughness variation in polycrystalline TiO₂ thin films

Ken ichi Katsumata, Akira Nakajima, Tadashi Shiota, Naoya Yoshida, Toshiya Watanabe, Yoshikazu Kameshima, Kiyoshi Okada

Research output: Contribution to journal › Article

29 Citations (Scopus)

Abstract

Photoinduced microstructural changes in transparent anatase thin films with large-grain polycrystallites (-200 nm) were evaluated using atomic force microscopy (AFM). Films were subjected to a vacuum ultraviolet (VUV) pretreatment before heating at 500 °C. Photoinduced wettability of the films was subsequently confirmed. Upon UV illumination, the surface image became blurred with an apparent increased surface roughness. The image sharpened gradually as the surface returned to its initial state. This microstructural surface change is most pronounced at grain boundaries.

Original language	English
Pages (from-to)	75-79
Number of pages	5
Journal	Journal of Photochemistry and Photobiology A: Chemistry
Volume	180
Issue number	1-2
DOIs	https://doi.org/10.1016/j.jphotochem.2005.09.023
Publication status	Published - May 15 2006

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Keywords

Surface morphology
Surface roughness
Titanium dioxide
Wetting

ASJC Scopus subject areas

Chemistry(all)
Chemical Engineering(all)
Physics and Astronomy(all)

Cite this

Katsumata, K. I., Nakajima, A., Shiota, T., Yoshida, N., Watanabe, T., Kameshima, Y., & Okada, K. (2006). Photoinduced surface roughness variation in polycrystalline TiO₂ thin films. Journal of Photochemistry and Photobiology A: Chemistry, 180(1-2), 75-79. https://doi.org/10.1016/j.jphotochem.2005.09.023

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AU - Kameshima, Yoshikazu

AU - Okada, Kiyoshi

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10.1016/j.jphotochem.2005.09.023