Photoinduced surface roughness variation in polycrystalline TiO2 thin films

Ken ichi Katsumata; Akira Nakajima; Tadashi Shiota; Naoya Yoshida; Toshiya Watanabe; Yoshikazu Kameshima; Kiyoshi Okada

doi:10.1016/j.jphotochem.2005.09.023

Photoinduced surface roughness variation in polycrystalline TiO₂ thin films

Ken ichi Katsumata, Akira Nakajima, Tadashi Shiota, Naoya Yoshida, Toshiya Watanabe, Yoshikazu Kameshima, Kiyoshi Okada

Research output: Contribution to journal › Article › peer-review

29 Citations (Scopus)

Abstract

Photoinduced microstructural changes in transparent anatase thin films with large-grain polycrystallites (-200 nm) were evaluated using atomic force microscopy (AFM). Films were subjected to a vacuum ultraviolet (VUV) pretreatment before heating at 500 °C. Photoinduced wettability of the films was subsequently confirmed. Upon UV illumination, the surface image became blurred with an apparent increased surface roughness. The image sharpened gradually as the surface returned to its initial state. This microstructural surface change is most pronounced at grain boundaries.

Original language	English
Pages (from-to)	75-79
Number of pages	5
Journal	Journal of Photochemistry and Photobiology A: Chemistry
Volume	180
Issue number	1-2
DOIs	https://doi.org/10.1016/j.jphotochem.2005.09.023
Publication status	Published - May 15 2006
Externally published	Yes

Keywords

Surface morphology
Surface roughness
Titanium dioxide
Wetting

ASJC Scopus subject areas

Chemistry(all)
Chemical Engineering(all)
Physics and Astronomy(all)

Access to Document

10.1016/j.jphotochem.2005.09.023

Cite this

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title = "Photoinduced surface roughness variation in polycrystalline TiO2 thin films",

abstract = "Photoinduced microstructural changes in transparent anatase thin films with large-grain polycrystallites (-200 nm) were evaluated using atomic force microscopy (AFM). Films were subjected to a vacuum ultraviolet (VUV) pretreatment before heating at 500 °C. Photoinduced wettability of the films was subsequently confirmed. Upon UV illumination, the surface image became blurred with an apparent increased surface roughness. The image sharpened gradually as the surface returned to its initial state. This microstructural surface change is most pronounced at grain boundaries.",

keywords = "Surface morphology, Surface roughness, Titanium dioxide, Wetting",

author = "Katsumata, {Ken ichi} and Akira Nakajima and Tadashi Shiota and Naoya Yoshida and Toshiya Watanabe and Yoshikazu Kameshima and Kiyoshi Okada",

note = "Funding Information: The authors are grateful to Mr. C.D. Madhusoodana for critical reading and editing of the manuscript. The present research is supported in part by a grant from the Ministry of Education, Culture, Sports, Science, and Technology of Japan (#17029017).",

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T1 - Photoinduced surface roughness variation in polycrystalline TiO2 thin films

AU - Katsumata, Ken ichi

AU - Nakajima, Akira

AU - Shiota, Tadashi

AU - Yoshida, Naoya

AU - Watanabe, Toshiya

AU - Kameshima, Yoshikazu

AU - Okada, Kiyoshi

N1 - Funding Information: The authors are grateful to Mr. C.D. Madhusoodana for critical reading and editing of the manuscript. The present research is supported in part by a grant from the Ministry of Education, Culture, Sports, Science, and Technology of Japan (#17029017).

PY - 2006/5/15

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AB - Photoinduced microstructural changes in transparent anatase thin films with large-grain polycrystallites (-200 nm) were evaluated using atomic force microscopy (AFM). Films were subjected to a vacuum ultraviolet (VUV) pretreatment before heating at 500 °C. Photoinduced wettability of the films was subsequently confirmed. Upon UV illumination, the surface image became blurred with an apparent increased surface roughness. The image sharpened gradually as the surface returned to its initial state. This microstructural surface change is most pronounced at grain boundaries.

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KW - Titanium dioxide

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