Origin of the field-stimulated exoelectron emission from tungsten tip surfaces

Tadashi Shiota; Masashi Morita; Masahito Tagawa; Nobuo Ohmae; Masataka Umeno

doi:10.1016/S0304-3991(97)00159-9

Origin of the field-stimulated exoelectron emission from tungsten tip surfaces

Tadashi Shiota, Masashi Morita, Masahito Tagawa, Nobuo Ohmae, Masataka Umeno

Research output: Contribution to journal › Conference article

1 Citation (Scopus)

Abstract

Emission characteristics of the field-stimulated exoelectron emission (FSEE) from tungsten surfaces and the effect of gas adsorption on the FSEE have been investigated. The clean tungsten tip surfaces were prepared using the field evaporation technique. The clean tungsten surfaces thus prepared did not liberate FSEE. Physical adsorption of the residual gas atoms at the tungsten surface resulted in FSEE. An obvious enhancement of the FSEE signal due to gas adsorption was observed in which no significant change of the field emission pattern was caused. Therefore, FSEE is thus revealed the high sensitivity to the surface conditions.

Original language	English
Pages (from-to)	217-221
Number of pages	5
Journal	Ultramicroscopy
Volume	73
Issue number	1-4
DOIs	https://doi.org/10.1016/S0304-3991(97)00159-9
Publication status	Published - Jun 1 1998
Externally published	Yes
Event	Proceedings of the 1997 44th International Field Emission Symposium - Tsukuba, Jpn Duration: Jul 7 1997 → Jul 11 1997

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Atomic and Molecular Physics, and Optics
Instrumentation

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title = "Origin of the field-stimulated exoelectron emission from tungsten tip surfaces",

abstract = "Emission characteristics of the field-stimulated exoelectron emission (FSEE) from tungsten surfaces and the effect of gas adsorption on the FSEE have been investigated. The clean tungsten tip surfaces were prepared using the field evaporation technique. The clean tungsten surfaces thus prepared did not liberate FSEE. Physical adsorption of the residual gas atoms at the tungsten surface resulted in FSEE. An obvious enhancement of the FSEE signal due to gas adsorption was observed in which no significant change of the field emission pattern was caused. Therefore, FSEE is thus revealed the high sensitivity to the surface conditions.",

author = "Tadashi Shiota and Masashi Morita and Masahito Tagawa and Nobuo Ohmae and Masataka Umeno",

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TY - JOUR

T1 - Origin of the field-stimulated exoelectron emission from tungsten tip surfaces

AU - Shiota, Tadashi

AU - Morita, Masashi

AU - Tagawa, Masahito

AU - Ohmae, Nobuo

AU - Umeno, Masataka

PY - 1998/6/1

Y1 - 1998/6/1

N2 - Emission characteristics of the field-stimulated exoelectron emission (FSEE) from tungsten surfaces and the effect of gas adsorption on the FSEE have been investigated. The clean tungsten tip surfaces were prepared using the field evaporation technique. The clean tungsten surfaces thus prepared did not liberate FSEE. Physical adsorption of the residual gas atoms at the tungsten surface resulted in FSEE. An obvious enhancement of the FSEE signal due to gas adsorption was observed in which no significant change of the field emission pattern was caused. Therefore, FSEE is thus revealed the high sensitivity to the surface conditions.

AB - Emission characteristics of the field-stimulated exoelectron emission (FSEE) from tungsten surfaces and the effect of gas adsorption on the FSEE have been investigated. The clean tungsten tip surfaces were prepared using the field evaporation technique. The clean tungsten surfaces thus prepared did not liberate FSEE. Physical adsorption of the residual gas atoms at the tungsten surface resulted in FSEE. An obvious enhancement of the FSEE signal due to gas adsorption was observed in which no significant change of the field emission pattern was caused. Therefore, FSEE is thus revealed the high sensitivity to the surface conditions.

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SP - 217

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JO - Ultramicroscopy

JF - Ultramicroscopy

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