Abstract
Emission characteristics of the field-stimulated exoelectron emission (FSEE) from tungsten surfaces and the effect of gas adsorption on the FSEE have been investigated. The clean tungsten tip surfaces were prepared using the field evaporation technique. The clean tungsten surfaces thus prepared did not liberate FSEE. Physical adsorption of the residual gas atoms at the tungsten surface resulted in FSEE. An obvious enhancement of the FSEE signal due to gas adsorption was observed in which no significant change of the field emission pattern was caused. Therefore, FSEE is thus revealed the high sensitivity to the surface conditions.
| Original language | English |
|---|---|
| Pages (from-to) | 217-221 |
| Number of pages | 5 |
| Journal | Ultramicroscopy |
| Volume | 73 |
| Issue number | 1-4 |
| DOIs | |
| Publication status | Published - Jun 1 1998 |
| Externally published | Yes |
| Event | Proceedings of the 1997 44th International Field Emission Symposium - Tsukuba, Jpn Duration: Jul 7 1997 → Jul 11 1997 |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Atomic and Molecular Physics, and Optics
- Instrumentation
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Cite this
Shiota, T., Morita, M., Tagawa, M., Ohmae, N., & Umeno, M. (1998). Origin of the field-stimulated exoelectron emission from tungsten tip surfaces. Ultramicroscopy, 73(1-4), 217-221. https://doi.org/10.1016/S0304-3991(97)00159-9