Opacity effect on extreme ultraviolet radiation from laser-produced tin plasmas

Shinsuke Fujioka, Hiroaki Nishimura, Katsunobu Nishihara, Akira Sasaki, Atsushi Sunahara, Tomoharu Okuno, Nobuyoshi Ueda, Tsuyoshi Ando, Yezheng Tao, Yoshinori Shimada, Kazuhisa Hashimoto, Michiteru Yamaura, Keisuke Shigemori, Mitsuo Nakai, Keiji Nagai, Takayoshi Norimatsu, Takeshi Nishikawa, Noriaki Miyanaga, Yasukazu Izawa, Kunioki Mima

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Abstract

Opacity effects on extreme ultraviolet (EUV) emission from laser-produced tin (Sn) plasma have been experimentally investigated. An absorption spectrum of a uniform Sn plasma generated by thermal x rays has been measured in the EUV range (9-19 nm wavelength) for the first time. Experimental results indicate that control of the optical depth of the laser-produced Sn plasma is essential for obtaining high conversion to 13.5 nm-wavelength EUV radiation; 1.8% of the conversion efficiency was attained with the use of 2.2 ns laser pulses.

Original languageEnglish
Article number235004
JournalPhysical Review Letters
Volume95
Issue number23
DOIs
Publication statusPublished - Dec 2 2005

ASJC Scopus subject areas

  • Physics and Astronomy(all)

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    Fujioka, S., Nishimura, H., Nishihara, K., Sasaki, A., Sunahara, A., Okuno, T., Ueda, N., Ando, T., Tao, Y., Shimada, Y., Hashimoto, K., Yamaura, M., Shigemori, K., Nakai, M., Nagai, K., Norimatsu, T., Nishikawa, T., Miyanaga, N., Izawa, Y., & Mima, K. (2005). Opacity effect on extreme ultraviolet radiation from laser-produced tin plasmas. Physical Review Letters, 95(23), [235004]. https://doi.org/10.1103/PhysRevLett.95.235004